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公开(公告)号：EP4462189A2
公开(公告)日：2024-11-13
申请号：EP24173154.6
申请日：2024-04-29
发明人： Masunaga, Keiichi , Watanabe, Satoshi , Fukushima, Masahiro , Kotake, Masaaki , Matsuzawa, Yuta
摘要： A chemically amplified positive resist composition is provided comprising (A) a quencher containing an onium salt having a nitrogen-containing aliphatic heterocycle and a fluorocarboxylic acid structure in its anion and (B) a base polymer containing a specific polymer which is decomposed under the action of acid to increase its solubility in alkaline developer. The resist composition exhibits a high resolution during pattern formation and forms a pattern of rectangular profile with improved LER, fidelity and dose margin.
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公开(公告)号：EP4459773A1
公开(公告)日：2024-11-06
申请号：EP22915606.2
申请日：2022-11-29
IPC分类号： H01M50/403 , C01B33/159 , H01M50/434 , H01M50/44 , H01M50/443 , H01M50/451 , H01M50/454
摘要： Provided is a coating material for a secondary battery separator, the coating material including surface-treated spherical silica particles that have on the surfaces thereof a R 1 SiO 3/2 unit (in the formula, R 1 is a univalent hydrocarbon group having 1-20 substituted or unsubstituted carbon atoms) and a R 2 3 SiO 1/2 unit (in the formula, R 2 is a univalent hydrocarbon group having 1-16 substituted or unsubstituted carbon atoms that are mutually the same or different), have a median diameter of 0.01-0.5 µm in a volume-based particle size distribution, and have a circularity of 0.8-1.0.
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公开(公告)号：EP4454559A1
公开(公告)日：2024-10-30
申请号：EP24169679.8
申请日：2024-04-11
发明人： Hatakeyama, Jun
IPC分类号： A61B5/268 , A61B5/28 , C08F212/14 , C08F220/18 , C08F220/24 , C08F220/38 , C08F230/02 , C08F230/08
摘要： The present invention is a bio-electrode, including: a living-body contact layer; and a substrate, wherein the living-body contact layer has a micropillar having a diameter within a range of 0.01 to 500 um and a height within a range of 0.1 to 1,000 um, and has an ionic polymer (A) as a material, and the component (A) has a repeating unit-a of one or more selected from a fluorosulfonic acid, a fluorosulfonimide, and a fluorosulfonamide, and has a weight-average molecular weight within a range of 1,000 to 500,000. This provides: a bio-electrode that is a thin film and highly transparent, that has high sensitivity to a bio-signal, excellent bio-compatibility, and a lightweight property, that can be manufactured at a low cost, that does not considerably deteriorate the sensitivity to the bio-signal even when being wet, dried, or attached to skin for a long term, and that is comfortable and free from itching, red spots, rash, etc. of the skin; and a method for manufacturing a bio-electrode.
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公开(公告)号：EP4450559A1
公开(公告)日：2024-10-23
申请号：EP22907264.0
申请日：2022-12-05
发明人： HARA Hiroyasu
摘要： Provided is a curable liquid silicone composition comprising two types of platinum catalysts which are a platinum catalyst that is activated by irradiation with UV rays to act as a hydrosilylation addition reaction catalyst and an aerobic platinum catalyst mixture that is activated by being in contact with moisture and/or oxygen, particularly with atmospheric moisture (humidity) and/or oxygen to act as hydrosilylation addition reaction catalyst. The curable liquid silicone composition has long-term storage stability as a single-liquid composition. Said composition is a curable liquid silicone rubber composition or a curable liquid silicone gel composition that, after being irradiated with UV rays at room temperature and further being exposed to the atmosphere for a prescribed time, exhibits excellent UV curing properties and favorable curing properties of a non-UV-irradiated part (shadow parts).
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公开(公告)号：EP4443240A3
公开(公告)日：2024-10-23
申请号：EP24165970.5
申请日：2024-03-25
发明人： FUKUSHIMA, Masahiro
摘要： A chemically amplified negative resist composition is provided comprising (A) a quencher in the form of an onium salt having a conjugated acid anion which is decomposed into carbon dioxide and an organic compound having no more than 12 carbon atoms and (B) a base polymer containing a specific polymer which is decomposed under the action of acid to increase its solubility in alkaline developer. The resist composition exhibits a high resolution during pattern formation and forms a pattern with improved LER, fidelity and dose margin.
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公开(公告)号：EP4443235A2
公开(公告)日：2024-10-09
申请号：EP24164620.7
申请日：2024-03-19
发明人： INAZUKI, Yukio , KOSAKA, Takuro , OGOSE, Taiga , MIMURA, Shohei
摘要： In a reflective mask blank including a substrate, a multilayer reflection film, a protection film, an absorber film and a hard mask film, the protection film is composed of a material containing ruthenium (Ru), the absorber film consists of a first layer and a second layer, or a first layer, a second layer and a third layer, the first layer has a composition containing tantalum (Ta) and being free of nitrogen (N), the second layer has a composition containing tantalum (Ta) and nitrogen (N), the third layer has a composition containing tantalum (Ta), nitrogen (N) and oxygen (O), and the hard mask film is composed of a material containing chromium (Cr).
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公开(公告)号：EP4442693A1
公开(公告)日：2024-10-09
申请号：EP22898316.9
申请日：2022-10-27
发明人： HIROKAMI, Munenao
IPC分类号： C07F7/18 , A01N55/10 , A01P1/00 , D06M13/513
CPC分类号： A01N55/00 , A01P3/00 , C07F7/18 , D06M13/513 , A01P1/00
摘要： This composition containing an organosilicon compound represented by formula (1) and an amino group-containing organosilicon compound can impart excellent washing durability and sustained antibacterial and antiviral performance to a synthetic fiber such as a polyester fiber.
(In the formula, R1 each independently represent a C1-C10 alkyl group or a C6-C10 aryl group, R2 each independently represent a C1-C10 alkyl group or a C6-C10 aryl group, R3 represents a C12-C24 alkyl group, R4 and R5 each independently represent a C1-C10 alkyl group, X represents a halogen atom, m represents an integer of 1-20, and n represents an integer of 1-3.)-
公开(公告)号：EP4438630A1
公开(公告)日：2024-10-02
申请号：EP24167683.2
申请日：2024-03-28
摘要： Provided is a method of continuously producing a depolymerized cellulose ether that is space-saving and highly productive, and is capable of reducing adhesion of a cellulose ether powder body to reactors and producing a depolymerized cellulose ether with a suppressed degree of yellowness and contaminants. The method includes: bringing a raw material cellulose ether that is of a temperature of 3°C to less than 40°C and is continuously supplied from a raw material tank 1 to a moisture conditioning tank 2 into contact with a water vapor B to obtain a moisture-conditioned cellulose ether; heating the moisture-conditioned cellulose ether to obtain a heated cellulose ether; continuously bringing a gaseous hydrogen chloride into contact with the heated cellulose ether to obtain a depolymerized cellulose ether product; and mixing the depolymerized cellulose ether product with a basic compound to obtain a depolymerized cellulose ether.
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9.发明公开
公开(公告)号：EP4435515A1
公开(公告)日：2024-09-25
申请号：EP24160203.6
申请日：2024-02-28
IPC分类号： G03F7/075
CPC分类号： G03F7/0752
摘要： The present invention is a composition for forming a silicon-containing resist underlayer film, containing a condensation reaction-type thermosetting silicon-containing material (Sx), being a polysiloxane resin, where the material has a non-condensation reactive organic group that reacts with a radical chemical species, the resin includes more than 0 and 70 mol% or less of one or more of a repeating unit represented by the following general formula (Sx-4) and a repeating unit represented by the general formula (Sx-5), and the organic group remains unreacted after a heat-curing reaction of the polysiloxane resin. This provides: a composition for forming a resist underlayer film containing a thermosetting silicon-containing material in photolithography using a high-energy beam, the material improving sensitivity, LWR, and resolution of an upper layer resist and further contributing to the prevention of pattern collapse; and a patterning process using the composition for forming a resist underlayer film.
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公开(公告)号：EP4432346A1
公开(公告)日：2024-09-18
申请号：EP22892599.6
申请日：2022-10-26
摘要： The present invention is a cover for a heat generating electronic component including a hollow structure having one or more openings for inserting an electronic circuit component, wherein an inner wall surface of the hollow structure has one or more protrusion portions. Thereby, a cover for a heat generating electronic component that can prevent detachment of the electronic component is provided.
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