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公开(公告)号：EP4394501A1
公开(公告)日：2024-07-03
申请号：EP22861339.4
申请日：2022-08-23
IPC分类号： G03F1/62
CPC分类号： G03F1/62
摘要： [Object] To improve the performance of a filter for a vent hole, which penetrates a pellicle frame, in response to the severe conditions of use required especially in EUV exposure. [Solution] A pellicle according to the present invention includes: a pellicle frame; an ultra-thin pellicle film provided on an upper end surface of the pellicle frame; a vent hole provided in the pellicle frame; and a filter that closes the vent hole. The filter includes a sheet composed partly or entirely of at least one of nanofibers and carbon nanotubes, and a support having openings and supporting the sheet.
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公开(公告)号：EP4379464A1
公开(公告)日：2024-06-05
申请号：EP22849593.3
申请日：2022-07-28
摘要： The present invention provides: a pellicle film including a film (BNNT film) having boron nitride nanotubes; and a pellicle for photolithography including a pellicle film and a pellicle frame, wherein the pellicle film is provided on one end surface of the pellicle frame via an adhesive, and the pellicle film includes a BNNT film. According to the present invention, it is possible to provide: a pellicle film which has a high permeation for EUV exposure, has excellent heat resistance and durability, and has hydrogen radical resistance; and a pellicle provided with the same.
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公开(公告)号：EP4383007A1
公开(公告)日：2024-06-12
申请号：EP22853079.6
申请日：2022-08-03
摘要： [Object] To improve the performance of a filter for a vent hole, which penetrates a pellicle frame, in response to a reduction in the maximum allowable size of foreign matter, which is required especially in EUV exposure, and to a severe change in atmospheric pressure to which a pellicle film is to be exposed.
[Solution] A pellicle according to the present invention includes: a pellicle frame 3; a pellicle film 1 provided on an upper end surface of the pellicle frame; a vent hole 6 provided in the pellicle frame; and a filter 7 that closes the vent hole. The filter includes a non-woven fabric composed partly or entirely of at least one of nanofibers and carbon nanotubes.-
公开(公告)号：EP4321931A1
公开(公告)日：2024-02-14
申请号：EP22784593.0
申请日：2022-03-30
发明人： NISHIMURA, Akinori
摘要： The purpose of the present invention is to provide a pellicle frame with an adhesive layer with which it is possible to prevent deterioration in the flatness of the adhesive layer more effectively than before, further to moderate the stress applied by a pellicle to a photomask, and as a result to reduce pellicle induced distortion (PID). The present invention provides a pellicle frame with an adhesive layer having one end surface on which a pellicle film is provided and another end surface provided with an adhesive layer for adhesion to a photomask, wherein the adhesive layer has a thickness of 0.10 to 0.30 mm, and the adhesive layer has an adhesive force of 5×10 -3 to 5×10 -1 N/cm. The present invention also provides a pellicle provided with a pellicle film on the one end surface.
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