发明专利
- 专利标题： Composition for forming ferroelectric film, its manufacturing method and manufacturing method of ferroelectric film
- 专利标题（中）： 用于形成电磁膜的组合物，其制造方法和制造方法的电磁膜
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申请号： JP2006308368申请日： 2006-11-14
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公开(公告)号： JP2008120644A公开(公告)日： 2008-05-29
- 发明人: KAMEI HIROYUKI
- 申请人： Seiko Epson Corp , セイコーエプソン株式会社
- 专利权人： Seiko Epson Corp,セイコーエプソン株式会社
- 当前专利权人： Seiko Epson Corp,セイコーエプソン株式会社
- 优先权： JP2006308368 2006-11-14
- 主分类号： C04B35/49
- IPC分类号： C04B35/49 ; C04B35/491 ; H01L41/187 ; H01L41/39 ; H01L41/43
摘要：
PROBLEM TO BE SOLVED: To provide a composition for forming a ferroelectric film which can form a ferroelectric film by an MOD method and by a low temperature firing, and to provide its manufacturing method and a manufacturing method of a ferroelectric film using it. SOLUTION: The composition for forming a ferroelectric film is one that is used for forming a ferroelectric film by the MOD method and contains an organometallic compound containing lead (Pb) and zirconium (Zr) and a methyl group and a carboxylate group, and a compound of a metal other than lead and zirconium. COPYRIGHT: (C)2008,JPO&INPIT
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