Provided is a block copolymer for lithography, having 3,000-30,000 of an average molecular weight number comprising: a first polymer block comprising a first monomer selected from a diene monomer, an aromatic vinyl monomer, a heteroaromatic vinyl monomer; and a second polymer block comprising a second monomer selected from a (meth)acrylate derivative, wherein the first polymer block and the second polymer block have at least 0.2 of an interaction parameter (χ) indicated by the mathematical formula 1 below: ′Mathematical Formula 1′ (In the formula above, χ refers to an interaction parameter, Vm to the molar volume of major polymer blocks, R to a gas constant, T to a temperature (K), δ_A to a solubility parameter of a homopolymer comprising the first monomer, and δ_B to a solubility parameter of a homopolymer comprising the second monomer).