本发明提供用于铜(Cu)、钨(W)、钛(Ti)、钽(Ta)、钴(Co)及铝(Al)的金属腐蚀抑制清洁组合物、方法及系统。该等金属腐蚀抑制清洁组合物借由使用二化学药品的组合-具有多于一胺基的至少一多官能基胺及具有多于一羧酸根的至少一多官能基酸-来提供腐蚀抑制效应。该等金属腐蚀抑制清洁组合物能有效清洁高密度等离子蚀刻继而以含氧等离子灰化所衍生的残余物；及化学机械抛光(CMP)之后剩下的浆料粒子和残余物。

There are provided metal corrosion inhibition cleaning compositions, methods and system for copper (Cu), tungsten(W), titanium(Ti), tantalum(Ta), cobalt (Co), and aluminum(Al). The metal corrosion inhibition cleaning compositions provide corrosion inhibition effects by use a combination of two chemicals - at least one multi-functional amine that has more than one amino groups; and at least one multi-functional acid that has more than one carboxylate groups. The metal corrosion inhibition cleaning compositions are effective for cleaning the residues deriving from high density plasma etching followed by ashing with oxygen containing plasmas; and slurry particles and residues remaining after chemical mechanical polishing (CMP).