- Patent Title: Method of aberration correction and charged particle beam system
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Application No.: US15386740Application Date: 2016-12-21
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Publication No.: US10014152B2Publication Date: 2018-07-03
- Inventor: Shigeyuki Morishita
- Applicant: JEOL Ltd.
- Applicant Address: JP
- Assignee: JEOL Ltd.
- Current Assignee: JEOL Ltd.
- Current Assignee Address: JP
- Agency: The Webb Law Firm
- Priority: JP2015-249731 20151222
- Main IPC: H01J37/00
- IPC: H01J37/00 ; H01J37/141 ; H01J37/12 ; H01J37/145

Abstract:
There are disclosed an aberration correction method and a charged particle beam system capable of correcting off-axis first order aberrations. The aberration correction method is for use in the charged particle beam system (100) equipped with an aberration corrector (30) which has plural stages of multipole elements (32a, 32b) and a transfer lens system (34) disposed between the multipole elements (32a, 32b). The method includes varying the excitation of the transfer lens system (34) and correcting off-axis first order aberrations.
Public/Granted literature
- US20170236681A1 Method of Aberration Correction and Charged Particle Beam System Public/Granted day:2017-08-17
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