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    Aberration Corrector and Charged Particle Beam Device
    6.
    发明申请
    Aberration Corrector and Charged Particle Beam Device 审中-公开

    公开(公告)号：US20190304739A1

    公开(公告)日：2019-10-03

    申请号：US16364726

    申请日：2019-03-26

    Applicant: JEOL Ltd.

    Inventor： Shigeyuki Morishita

    IPC: H01J37/10 ,  H01J37/28 ,  H01J37/153

    Abstract: An aberration corrector includes: a first multipole, a second multipole, a third multipole, and a fourth multipole arranged along an optical axis A; a first transfer lens system arranged between the first multipole and the second multipole; a second transfer lens system arranged between the second multipole and the third multipole; and a third transfer lens system arranged between the third multipole and the fourth multipole, wherein each of the first multipole, the second multipole, the third multipole, and the fourth multipole generates a three-fold symmetric field.

    Electron Microscope and Aberration Measurement Method
    9.
    发明公开
    Electron Microscope and Aberration Measurement Method 审中-公开

    公开(公告)号：US20230349839A1

    公开(公告)日：2023-11-02

    申请号：US18125460

    申请日：2023-03-23

    Applicant: JEOL Ltd.

    Inventor： Hidetaka Sawada ,  Takeshi Kaneko ,  Shigeyuki Morishita ,  Yuji Kohno

    IPC: G01N23/18 ,  G01N23/04

    CPC classification number: G01N23/04 ,  G01N23/18 ,  G01N2223/3301 ,  G01N2223/418

    Abstract: An electron microscope includes an irradiation optical system that focuses electron beams and scans a specimen with the focused electron beams; a deflector that deflects the electron beams transmitted through the specimen; a detector that detects the electron beams transmitted through the specimen; and a control unit that controls the irradiation optical system and the deflector The control unit causes the irradiation optical system to scan the specimen with the electron beams so that the electron beams have a plurality of irradiation positions on the specimen. The control unit causes the deflector to repeatedly deflect the electron beams transmitted through each of the irradiation positions, so that a plurality of electron beams which have the same irradiation position and different incident angle ranges with respect to the specimen are caused to sequentially enter the detector.

    Scanning transmission electron microscope and aberration correction method
    10.
    发明授权
    Scanning transmission electron microscope and aberration correction method 有权

    公开(公告)号：US11087951B2

    公开(公告)日：2021-08-10

    申请号：US16776153

    申请日：2020-01-29

    Applicant: JEOL Ltd.

    Inventor： Shigeyuki Morishita ,  Izuru Chiyo

    IPC: H01J37/153 ,  H01J37/22 ,  H01J37/28

    Abstract: In a scanning transmission electron microscope, a control unit performs: processing of calculating a first auto-correlation function that is an auto-correlation function of a first scanning transmission electron microscope image; processing of acquiring a first intensity profile along a straight line that passes through a center of the first auto-correlation function; processing of obtaining a position of an inflection point that is closest to the center of the first auto-correlation function in the first intensity profile and adopting an intensity at the position as a first reference intensity; processing of obtaining an aberration coefficient by fitting a first aberration function to an isointensity line that connects positions where intensity is equal to the first reference intensity in the first auto-correlation function and by fitting a second aberration function to an isointensity line that connects positions where intensity is equal to a second reference intensity in a second auto-correlation function; and processing of controlling an electron optical system based on the aberration coefficient.

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