Invention Grant
- Patent Title: Doped silica-titania glass having low expansivity and methods of making the same
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Application No.: US14950374Application Date: 2015-11-24
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Publication No.: US10017413B2Publication Date: 2018-07-10
- Inventor: Sezhian Annamalai , Carlos Alberto Duran , Kenneth Edward Hrdina , Lisa Anne Moore
- Applicant: CORNING INCORPORATED
- Applicant Address: US NY Corning
- Assignee: Corning Incorporated
- Current Assignee: Corning Incorporated
- Current Assignee Address: US NY Corning
- Agent John P. Ciccarelli
- Main IPC: C03C3/06
- IPC: C03C3/06 ; C03C3/112 ; C03C3/089 ; G03F1/22 ; C03B25/02 ; C03B19/02 ; C03C3/115 ; C03C21/00 ; C03C23/00 ; C03B5/225 ; C03B25/00
Abstract:
A method of forming a doped silica-titania glass is provided. The method includes blending batch materials comprising silica, titania, and at least one dopant. The method also includes heating the batch materials to form a glass melt. The method further includes consolidating the glass melt to form a glass article, and annealing the glass article.
Public/Granted literature
- US20160145147A1 DOPED SILICA-TITANIA GLASS HAVING LOW EXPANSIVITY AND METHODS OF MAKING THE SAME Public/Granted day:2016-05-26
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