Abstract:
Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.
Abstract:
A doped silica-titania glass article is provided that includes a glass article having a glass composition comprising (i) a silica-titania base glass, (ii) a fluorine dopant, and (iii) a second dopant. The fluorine dopant has a concentration of fluorine of up to 5 wt. % and the second dopant comprises one or more oxides selected from the group consisting of Al, Nb, Ta, B, Na, K, Mg, Ca and Li oxides at a total oxide concentration from 50 ppm to 6 wt. %. Further, the glass article has an expansivity slope of less than 0.5 ppb/K2 at 20° C. The second dopant can be optional. The composition of the glass article may also contain an OH concentration of less than 100 ppm.
Abstract:
A method of forming a doped silica-titania glass is provided. The method includes blending batch materials comprising silica, titania, and at least one dopant. The method also includes heating the batch materials to form a glass melt. The method further includes consolidating the glass melt to form a glass article, and annealing the glass article.
Abstract:
This disclosure is directed to a silica-titania-niobia glass and to a method for making the glass. The composition of the silica-titania-niobia (SiO2—TiO2—Nb2O5) glass, determined as the oxides, is Nb2O5 in an amount in the range of 0.005 wt. % to 1.2 wt. %, TiO2 in an amount in the range of 5 wt. % to 10 wt. %, and the remainder of glass is SiO2. In the method, the STN glass precursor is consolidated into a glass by heating to a temperature of 1600° C. to 1700° C. in flowing helium for 6 hours to 10 hours. When this temperature is reached, the helium flow can be replaced by argon for the remainder of the time. Subsequently the glass is cooled to approximately 1050° C., and then from 1050° C. to 700° C. followed by turning off the furnace and cooling the glass to room temperature at the natural cooling rate of the furnace.
Abstract:
This disclosure is directed to a silica-titania-niobia glass and to a method for making the glass. The composition of the silica-titania-niobia (SiO2—TiO2—Nb2O5) glass, determined as the oxides, is Nb2O5 in an amount in the range of 0.005 wt. % to 1.2 wt. %, TiO2 in an amount in the range of 5 wt. % to 10 wt. %, and the remainder of glass is SiO2. In the method, the STN glass precursor is consolidated into a glass by heating to a temperature of 1600° C. to 1700° C. in flowing helium for 6 hours to 10 hours. When this temperature is reached, the helium flow can be replaced by argon for the remainder of the time. Subsequently the glass is cooled to approximately 1050° C., and then from 1050° C. to 700° C. followed by turning off the furnace and cooling the glass to room temperature at the natural cooling rate of the furnace.
Abstract:
A method of forming a doped silica-titania glass is provided. The method includes blending batch materials comprising silica, titania, and at least one dopant. The method also includes heating the batch materials to form a glass melt. The method further includes consolidating the glass melt to form a glass article, and annealing the glass article.
Abstract:
A glass composite for use in Extreme Ultra-Violet Lithography (EUVL) is provided. The glass composite includes a first silica-titania glass section. The glass composite further includes a second doped silica-titania glass section mechanically bonded to a surface of the first silica-titania glass section, wherein the second doped silica-titania glass section has a thickness of greater than about 1.0 inch.
Abstract:
Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.
Abstract:
A doped silica-titania (“DST”) glass article that includes a glass article having a glass composition comprising a silica-titania base glass containing titania at 7 to 14 wt. % and a balance of silica, and a dopant selected from the group consisting of (a) F at 0.7 to 1.5 wt. %, (b) B2O3 at 1.5 to 5 wt. %, (c) OH at 1000 to 3000 ppm, and (d) B2O3 at 0.5 to 2.5 wt. % and OH at 100 to 1400 ppm. The glass article has an expansivity slope of less than about 1.3 ppb/K2 at 20° C. For DST glass articles doped with F or B2O3, the OH level can be held to less than 10 ppm, or less than 100 ppm, respectively. In many aspects, the DST glass articles are substantially free of titania in crystalline form.
Abstract:
A boron-doped titania-silica glass containing 0.1 wt % to 8.0 wt % boron, 9.0 wt % to 16.0 wt % TiO2, and 76.0 wt % to 90.9 wt % SiO2. The glass may further include F, Nb, Ta, Al, Li, Na, K, Ca, and Mg, individually or in combinations of two or more, at levels up to 4 wt %. The glass may have an OH concentration of more than 10 ppm. The glass features a CTE slope at 20° C. of less than 1 ppb/K2. The fictive temperature of the glass is less than 825° C. and the peak CTE of the glass is less than 30 ppb/K. The glass has two crossover temperatures and a wide temperature interval over which CTE is close to zero. The uniformity of each crossover temperature relative to its average over a volume of at least 50 cm3 is within ±5° C.