- 专利标题： Lithographic apparatus, drying device, metrology apparatus and device manufacturing method
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申请号： US15452445申请日： 2017-03-07
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公开(公告)号： US10018925B2公开(公告)日： 2018-07-10
- 发明人: Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Joost Jeroen Ottens , Marcel Beckers , Marco Polizzi , Michel Riepen , Anthonie Kuijper , Koen Steffens , Adrianes Johannes Baeten , Anca Mihaela Antonevici
- 申请人： ASML NETHERLANDS B.V.
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; G03B27/58 ; G03B27/60 ; G03F7/20 ; B01D19/00
摘要：
An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
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