Invention Grant
- Patent Title: Treatment solution supply method, treatment solution supply apparatus, and non-transitory computer-readable recording medium
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Application No.: US14724922Application Date: 2015-05-29
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Publication No.: US10023477B2Publication Date: 2018-07-17
- Inventor: Masato Hayashi , Toyohisa Tsuruda , Masayuki Kajiwara
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Posz Law Group, PLC
- Priority: JP2014-130151 20140625; JP2015-082541 20150414
- Main IPC: C02F1/463
- IPC: C02F1/463 ; C02F1/461 ; C02F103/02 ; G03F7/30
Abstract:
A treatment solution supply method of supplying a treatment solution to a substrate, the method includes the steps of: applying a DC voltage to the treatment solution; detecting a potential difference between two points in the treatment solution in a state where the DC voltage is applied to the treatment solution; and increasing the DC voltage when the detected potential difference is less than a predetermined reference value.
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