公开(公告)号：US12032294B2

公开(公告)日：2024-07-09

申请号：US17048214

申请日：2019-04-01

Applicant: Tokyo Electron Limited

Inventor： Masato Hayashi ,  Takuya Mori ,  Hideo Shite ,  Hirokazu Sakamoto

IPC: G03F7/16 ,  B05C9/14 ,  B05C11/08 ,  H01L21/027 ,  H01L21/66

CPC classification number: G03F7/162 ,  B05C9/14 ,  B05C11/08 ,  G03F7/168 ,  H01L21/0273 ,  H01L22/20

Abstract: A device includes a chemical solution flow path in which a chemical solution containing polymers flows; a laser beam irradiator configured to irradiate a laser beam to the chemical solution flow path such that an optical path is intersected with a flow direction of the chemical solution in the chemical solution flow path; a light receiving element provided in the optical path passing through the chemical solution flow path; a detector configured to detect, based on a signal output from the light receiving element, an abnormality in a state of polymers corresponding to a majority of the polymers contained in the chemical solution or configured to detect a ratio between a chemical solution containing the polymers and another chemical solution in the chemical solution flow path.

公开(公告)号：US20240125697A1

公开(公告)日：2024-04-18

申请号：US18535134

申请日：2023-12-11

Applicant: Tokyo Electron Limited

Inventor： Koudai Higashi ,  Masato Hayashi ,  Kohei Noguchi

IPC: G01N21/39 ,  G01N21/85

CPC classification number: G01N21/39 ,  G01N21/85 ,  G01N2021/392

Abstract: A substrate processing apparatus includes a supply channel through which a liquid to be supplied to a substrate flows; and a foreign substance detecting unit configured to detect a foreign substance in the liquid based on a signal obtained when light, which is near-infrared light, is radiated toward a flow path forming unit constituting a part of the supply channel by a light projector so that light is emitted from the flow path forming unit and a light receiver receives the light emitted from the flow path forming unit.

公开(公告)号：US11340152B2

公开(公告)日：2022-05-24

申请号：US17245220

申请日：2021-04-30

Applicant: TOKYO ELECTRON LIMITED

Inventor： Masato Hayashi ,  Kohei Noguchi ,  Koudai Higashi ,  Makoto Ogata

IPC: G03F7/20 ,  G01N15/02 ,  H01L21/67 ,  G01N15/00

Abstract: According to one embodiment of the present disclosure, there is provided a substrate processing apparatus comprising: a supply passage through which fluid supplied to a substrate flows; and a foreign substance detector including a channel forming part forming a portion of the supply passage, a light projector irradiating light to the channel forming part, and a light receiver receiving light emitted from the channel forming part as a result of irradiating light to the channel forming part by the light projector, the foreign substance detector being configured to detect a foreign substance in the fluid based on a signal obtained by the light that the light receiver receives, wherein the light projector and the light receiver in the foreign substance detector are disposed in areas that are not opposite to each other in areas in upper, lower, left, right, front and rear directions of the channel forming part.

公开(公告)号：US20220112601A1

公开(公告)日：2022-04-14

申请号：US17498886

申请日：2021-10-12

Applicant: Tokyo Electron Limited

Inventor： Ryo Araki ,  Junnosuke Maki ,  Mitsuteru Yano ,  Masato Hayashi

IPC: C23C16/455 ,  C23C16/46

Abstract: A substrate processing apparatus configured to process a substrate includes a functional component constituting a part of the substrate processing apparatus; a nozzle, provided on a surface of the functional component, allowing a gas to pass therethrough; a nozzle flow path which is connected to the nozzle of the functional component and through which the gas flows; a flow rate sensor configured to measure a flow rate of the gas flowing through the nozzle flow path; and a controller configured to make a determination upon a state of a distance between an interfering object and the functional component based on a measurement result obtained by the flow rate sensor.

公开(公告)号：US20210157237A1

公开(公告)日：2021-05-27

申请号：US17048214

申请日：2019-04-01

Applicant: Tokyo Electron Limited

Inventor： Masato Hayashi ,  Takuya Mori ,  Hideo Shite ,  Hirokazu Sakamoto

IPC: G03F7/16 ,  B05C9/14 ,  B05C11/08 ,  H01L21/66 ,  H01L21/027

Abstract: A device includes a chemical solution flow path in which a chemical solution containing polymers flows; a laser beam irradiator configured to irradiate a laser beam to the chemical solution flow path such that an optical path is intersected with a flow direction of the chemical solution in the chemical solution flow path; a light receiving element provided in the optical path passing through the chemical solution flow path; a detector configured to detect, based on a signal output from the light receiving element, an abnormality in a state of polymers corresponding to a majority of the polymers contained in the chemical solution or configured to detect a ratio between a chemical solution containing the polymers and another chemical solution in the chemical solution flow path.

公开(公告)号：US11920240B2

公开(公告)日：2024-03-05

申请号：US17498886

申请日：2021-10-12

Applicant: Tokyo Electron Limited

Inventor： Ryo Araki ,  Junnosuke Maki ,  Mitsuteru Yano ,  Masato Hayashi

IPC: C23C16/455 ,  B05B12/00 ,  C23C16/46

CPC classification number: C23C16/45563 ,  B05B12/004 ,  C23C16/45557 ,  C23C16/463

Abstract: A substrate processing apparatus configured to process a substrate includes a functional component constituting a part of the substrate processing apparatus; a nozzle, provided on a surface of the functional component, allowing a gas to pass therethrough; a nozzle flow path which is connected to the nozzle of the functional component and through which the gas flows; a flow rate sensor configured to measure a flow rate of the gas flowing through the nozzle flow path; and a controller configured to make a determination upon a state of a distance between an interfering object and the functional component based on a measurement result obtained by the flow rate sensor.

公开(公告)号：US09953853B2

公开(公告)日：2018-04-24

申请号：US14759824

申请日：2014-01-31

Applicant: TOKYO ELECTRON LIMITED

Inventor： Masato Hayashi ,  Koudai Higashi

IPC: H01L21/677 ,  H01L21/67 ,  H01L21/687

CPC classification number: H01L21/67265 ,  H01L21/67288 ,  H01L21/67712 ,  H01L21/67724 ,  H01L21/67772 ,  H01L21/67775 ,  H01L21/67778 ,  H01L21/68707

Abstract: A substrate transport apparatus for detecting with high accuracy rubbing between a substrate held in a substrate holding tool, and a support which transports a substrate. The substrate transport apparatus includes: a stage for placing thereon the substrate holding tool; a substrate transport mechanism including the support for the substrate, and a back-and-forth movement mechanism for moving the support, the mechanism configured to transfer a substrate to/from the substrate holding tool; a lifting mechanism for moving the support up and down with respect to the substrate holding tool; a sound amplifying section for amplifying a contact sound generated by contact between a substrate held in the substrate holding tool and the support; and a detection section for detecting rubbing between a substrate and the support based on a detection signal from a vibration sensor which detects a solid-borne sound, propagating through the substrate holding tool, and outputs the detection signal.

公开(公告)号：US09818654B2

公开(公告)日：2017-11-14

申请号：US15171240

申请日：2016-06-02

Applicant: Tokyo Electron Limited

Inventor： Masato Hayashi ,  Kohei Noguchi ,  Kenji Iizuka ,  Naruaki Iida

IPC: H01L21/027 ,  H01L21/66 ,  H01L21/67 ,  G01N21/85 ,  G03F7/16

CPC classification number: H01L22/10 ,  G01N21/85 ,  G01N2021/8578 ,  G03F7/16 ,  G03F7/162 ,  H01L21/0273 ,  H01L21/67253

Abstract: An apparatus includes: measurement flow passage portions as part of a respective plurality of supply paths of fluids to be supplied to a substrate, the measurement flow passage portions constituting measurement regions for measurement of foreign matter in the fluids, and being disposed so as to form a row with each other; a light irradiating unit configured to form an optical path in one of the flow passage portions, the light irradiating unit being shared by the plurality of flow passage portions; a moving mechanism configured to move the light irradiating unit relatively along a direction of arrangement of the flow passage portions to form the optical path within the flow passage portion selected among the plurality of flow passage portions; a light receiving unit including a light receiving element, the light receiving element receiving light transmitted by the flow passage portion; and a detecting unit configured to detect foreign matter in the fluid on a basis of a signal output from the light receiving element. Consequently, the number of necessary light irradiating units can be reduced, and the apparatus can be miniaturized.

公开(公告)号：US20220326133A1

公开(公告)日：2022-10-13

申请号：US17809365

申请日：2022-06-28

Applicant: Tokyo Electron Limited

Inventor： Masato Hayashi ,  Kohei Noguchi ,  Daisuke Kajiwara ,  Koudai Higashi

IPC: G01N15/06 ,  G01N21/51 ,  G01N21/53

Abstract: A foreign substance detection device includes a flow path unit through which a fluid is flown; an optical system configured to flatten a laser light from a laser source to be lengthened in a direction intersecting with a flow direction of the fluid; a laser light irradiation unit provided such that an optical path intersects with the flow direction and configured to irradiate the laser light into the flow path unit; a light detection unit which is provided on the optical path having passed through the flow path unit and includes light receiving elements arranged in a lengthwise direction of a transversal cross section of the optical path; a foreign substance detection unit configured to compare a signal level corresponding to intensity of light received by each light receiving element with a threshold value and configured to detect the foreign substances based on a comparison result.

公开(公告)号：US11433420B2

公开(公告)日：2022-09-06

申请号：US16768216

申请日：2018-12-07

Applicant: Tokyo Electron Limited

Inventor： Ryouichirou Naitou ,  Masato Hayashi ,  Hideo Shite ,  Hiroyuki Ide ,  Yosuke Kameda ,  Seiya Totsuka ,  Atsumu Maita ,  Takami Satoh ,  Hirofumi Araki ,  Kentaro Yoshihara

IPC: B05C19/06 ,  B05C11/10 ,  H01L21/67

Abstract: A solution supply apparatus is for supplying a treatment solution to a treatment solution discharger which discharges the treatment solution to a treatment object. The solution supply apparatus includes: a supply pipe line connected to the treatment solution discharger; a filter provided on the supply pipe line which filters the treatment solution to remove foreign substances; and a controller. The controller performs a determination of a state of the treatment solution to be supplied to a primary side of the filter and, when the state of the treatment solution is determined to be bad, outputs a control signal for restricting supply of the treatment solution to the primary side of the filter.