Invention Grant
- Patent Title: Synthetic amorphous silica powder and method for producing same
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Application No.: US14804857Application Date: 2015-07-21
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Publication No.: US10023488B2Publication Date: 2018-07-17
- Inventor: Toshiaki Ueda
- Applicant: MITSUBISHI MATERIALS CORPORATION
- Applicant Address: JP Tokyo
- Assignee: MITSUBISHI MATERIALS CORPORATION
- Current Assignee: MITSUBISHI MATERIALS CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Locke Lord LLP
- Agent James E. Armstrong, IV; Nicholas J. DeCeglie, Jr.
- Priority: JP2010-001790 20100107
- Main IPC: C03B19/10
- IPC: C03B19/10 ; C01B33/18 ; C03C23/00 ; C01B33/14 ; C03C3/06

Abstract:
The synthetic amorphous silica powder of the present invention is characterized in that it comprises a synthetic amorphous silica powder obtained by applying a spheroidizing treatment to a silica powder, and by subsequently cleaning and drying it so that the synthetic amorphous silica powder has an average particle diameter D50 of 10 to 2,000 μm; wherein the synthetic amorphous silica powder has: a quotient of 1.00 to 1.35 obtained by dividing a BET specific surface area of the powder by a theoretical specific surface area calculated from the average particle diameter D50; a real density of 2.10 to 2.20 g/cm3; an intra-particulate porosity of 0 to 0.05; a circularity of 0.75 to 1.00; and an unmolten ratio of 0.00 to 0.25. This synthetic amorphous silica powder is less in amount of gas components adsorbed to surfaces of particles of the powder and in amount of gas components within the particles, so that a synthetic silica glass product manufactured by using the powder is remarkably decreased in amount of generation or degree of expansion of gas bubbles even upon usage of the product in a high temperature and reduced pressure environment.
Public/Granted literature
- US20150321939A1 SYNTHETIC AMORPHOUS SILICA POWDER AND METHOD FOR PRODUCING SAME Public/Granted day:2015-11-12
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