Invention Grant
- Patent Title: Method and system for wet chemical bath process
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Application No.: US15272876Application Date: 2016-09-22
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Publication No.: US10043650B2Publication Date: 2018-08-07
- Inventor: Yung-Ho Chen
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: McClure, Qualey & Rodack, LLP
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/67
Abstract:
A method for performing a wet chemical process over a semiconductor wafer is provided. The method includes moving the semiconductor wafer into a chemical solution. The method further includes leaving the semiconductor wafer in the chemical solution for a processing time period. The method also includes turning the semiconductor wafer upside down while the wafer is in the chemical solution. Moreover, the method includes removing the semiconductor wafer from the chemical solution.
Public/Granted literature
- US20180082834A1 METHOD AND SYSTEM FOR WET CHEMICAL BATH PROCESS Public/Granted day:2018-03-22
Information query
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