公开(公告)号：US20210125850A1

公开(公告)日：2021-04-29

申请号：US16667815

申请日：2019-10-29

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yung-Ho Chen ,  Chung-Hsung Yang

IPC: H01L21/677 ,  B65G1/137

Abstract: A system and an operating method for automated wafer carrier handling are provided. The system includes a storage rack including a standby position and a storage position separated from each other, a first and second moving mechanism, and a controller operatively coupled to the first and second moving mechanism to control operations of the first and second moving mechanism. The storage position is for buffering a wafer carrier awaiting transfer to a load port. The first moving mechanism is movably coupled to the storage rack and provides at least one degree of freedom of movement to transfer the wafer carrier from the storage position to the standby position. The second moving mechanism is disposed over the storage rack, operatively coupled the storage rack to the load port, and provides at least one degree of freedom of movement to transfer the wafer carrier from the standby position to the load port.

公开(公告)号：US11551959B2

公开(公告)日：2023-01-10

申请号：US16667815

申请日：2019-10-29

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yung-Ho Chen ,  Chung-Hsung Yang

IPC: H01L21/677 ,  B65G1/137

Abstract: A system and an operating method for automated wafer carrier handling are provided. The system includes a storage rack including a standby position and a storage position separated from each other, a first and second moving mechanism, and a controller operatively coupled to the first and second moving mechanism to control operations of the first and second moving mechanism. The storage position is for buffering a wafer carrier awaiting transfer to a load port. The first moving mechanism is movably coupled to the storage rack and provides at least one degree of freedom of movement to transfer the wafer carrier from the storage position to the standby position. The second moving mechanism is disposed over the storage rack, operatively coupled the storage rack to the load port, and provides at least one degree of freedom of movement to transfer the wafer carrier from the standby position to the load port.

公开(公告)号：US10043650B2

公开(公告)日：2018-08-07

申请号：US15272876

申请日：2016-09-22

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yung-Ho Chen

IPC: H01L21/02 ,  H01L21/67

Abstract: A method for performing a wet chemical process over a semiconductor wafer is provided. The method includes moving the semiconductor wafer into a chemical solution. The method further includes leaving the semiconductor wafer in the chemical solution for a processing time period. The method also includes turning the semiconductor wafer upside down while the wafer is in the chemical solution. Moreover, the method includes removing the semiconductor wafer from the chemical solution.

公开(公告)号：US09772563B2

公开(公告)日：2017-09-26

申请号：US13928414

申请日：2013-06-27

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yung-Ho Chen ,  Wen-Chieh Tsou ,  Chih-Wei Huang ,  Wei-Cheng Wang

IPC: H01L21/677 ,  G03F7/20 ,  G05B19/418

CPC classification number: G03F7/70741 ,  G05B19/4189 ,  G05B2219/45031 ,  G05B2219/45057 ,  Y02P90/28

Abstract: At least a first reticle is stored in a housing of a stocker. A first gas is delivered to the housing. At least one reticle pod having an additional reticle is delivered into a enclosure within the housing of the stocker. A second gas different from the first gas is delivered to the enclosure. The reticle pod is automatically retrieved from the enclosure. The delivery and retrieval of the reticle pod and delivery of the first gas and the second gas are automatically controlled.