Invention Grant
- Patent Title: Solid-state imaging device having an anti-reflection feature and method for manufacturing the same
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Application No.: US15720993Application Date: 2017-09-29
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Publication No.: US10044918B2Publication Date: 2018-08-07
- Inventor: Yoshiaki Masuda , Yuki Miyanami , Hideshi Abe , Tomoyuki Hirano , Masanari Yamaguchi , Yoshiki Ebiko , Kazufumi Watanabe , Tomoharu Ogita
- Applicant: SONY CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sheridan Ross P.C.
- Priority: JP2013-139830 20130703; JP2014-104167 20140520
- Main IPC: H04N5/225
- IPC: H04N5/225 ; H04N5/369 ; H01L27/146 ; H01L31/0232 ; G02B1/118

Abstract:
The present disclosure relates to a solid-state imaging device, a method for manufacturing the same, and an electronic apparatus capable of improving sensitivity while suppressing degradation of color mixture. The solid-state imaging device includes an anti-reflection portion having a moth-eye structure provided on a boundary surface on a light-receiving surface side of a photoelectric conversion region of each pixel arranged two-dimensionally, and an inter-pixel light-blocking portion provided below the boundary surface of the anti-reflection portion to block incident light. In addition, the photoelectric conversion region is a semiconductor region, and the inter-pixel light-blocking portion has a trench structure obtained by digging the semiconductor region in a depth direction at a pixel boundary. The techniques according to the present disclosure can be applied to, for example, a solid-state imaging device of a rear surface irradiation type.
Public/Granted literature
- US20180027157A1 SOLID-STATE IMAGING DEVICE AND METHOD FOR MANUFACTURING THE SAME, AND ELECTRONIC APPARATUS Public/Granted day:2018-01-25
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