Invention Grant
- Patent Title: Physical vapor deposition system with target magnets controlled to only be above workpiece
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Application No.: US14923353Application Date: 2015-10-26
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Publication No.: US10053771B2Publication Date: 2018-08-21
- Inventor: Ravi Mullapudi , Manohar Korlapati
- Applicant: Tango Systems, Inc.
- Applicant Address: US CA San Jose
- Assignee: Tango Systems Inc.
- Current Assignee: Tango Systems Inc.
- Current Assignee Address: US CA San Jose
- Agency: Patent Law Group LLP
- Agent Brian D. Ogonowsky
- Main IPC: C23C14/34
- IPC: C23C14/34 ; C23C14/35 ; H01J37/34 ; C23C14/50 ; H01J37/32 ; C23C14/54 ; C23C14/08

Abstract:
A circular PVD chamber has a plurality of sputtering targets mounted on a top wall of the chamber. A pallet in the chamber is coupled to a motor for rotating the pallet about its center axis. The pallet has a diameter less than the diameter of the circular chamber. The pallet is also shiftable in an XY direction to move the center of the pallet beneath any of the targets so all areas of a workpiece supported by the pallet can be positioned directly below any one of the targets. A scanning magnet is in back of each target and is moved, via a programmed controller, to only be above portions of the workpiece so that no sputtered material is wasted. For depositing a material onto small workpieces, a cooling backside gas volume is created between the pallet and the underside of sticky tape supporting the workpieces.
Public/Granted literature
- US20170114447A1 PHYSICAL VAPOR DEPOSITION SYSTEM WITH TARGET MAGNETS CONTROLLED TO ONLY BE ABOVE WORKPIECE Public/Granted day:2017-04-27
Information query
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