Invention Grant
- Patent Title: Method and apparatus for enhancing guardbands using “in-situ” silicon measurements
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Application No.: US14667365Application Date: 2015-03-24
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Publication No.: US10060966B2Publication Date: 2018-08-28
- Inventor: Sankaran M. Menon , Vasudev Bibikar
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: INTEL CORPORATION
- Current Assignee: INTEL CORPORATION
- Current Assignee Address: US CA Santa Clara
- Agency: Womble Bond Dickinson (US) LLP
- Main IPC: H01L23/58
- IPC: H01L23/58 ; G01R31/26 ; G06F1/32 ; H01L21/66

Abstract:
A method and apparatus (e.g., semiconductor device) for setting voltages (e.g., guardbands) using “in situ,” or on-die, silicon measurements are described. In one embodiment the semiconductor device comprises: a process monitor to measure silicon parameters of the semiconductor device; and a controller coupled to the process monitor to set a voltage for use on at least a portion of the semiconductor device based on silicon process monitor measurements.
Public/Granted literature
- US20160285434A1 METHOD AND APPARATUS FOR ENHANCING GUARDBANDS USING "IN-SITU" SILICON MEASUREMENTS Public/Granted day:2016-09-29
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