Invention Grant
- Patent Title: Semiconductor device having contact plug and method of forming the same
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Application No.: US15460897Application Date: 2017-03-16
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Publication No.: US10062691B2Publication Date: 2018-08-28
- Inventor: Hyerim Moon , Myounghun Choi
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2015-0062534 20150504
- Main IPC: H01L29/40
- IPC: H01L29/40 ; H01L21/44 ; H01L27/088 ; H01L27/092 ; H01L21/8234 ; H01L27/02 ; H01L27/06 ; H01L23/528

Abstract:
A semiconductor device includes merged contact plugs. A multi-fin active having N sub-fins is formed in a substrate. A contact plug is formed on the impurity areas. N is an integer between about eight (8) and about one thousand (1000). The N sub-fins include a first sub-fin formed in the outermost portion of the multi-fin active and a second sub-fin formed near the first sub-fin. A straight line perpendicular to a surface of the substrate and passes through a virtual bottom edge of the contact plug is disposed between the first sub-fin and the second sub-fin, or through the second sub-fin. The virtual bottom edge of the contact plug is defined at a cross point of a correlation line extending on a side surface of the contact plug and a horizontal line in contact with a lowermost end of the contact plug and parallel to the surface of the substrate.
Public/Granted literature
- US20170186744A1 SEMICONDUCTOR DEVICE HAVING CONTACT PLUG AND METHOD OF FORMING THE SAME Public/Granted day:2017-06-29
Information query
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