- 专利标题: Composition for forming organic semiconductor film, organic semiconductor element, and method for manufacturing organic semiconductor element
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申请号: US15375187申请日: 2016-12-12
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公开(公告)号: US10062851B2公开(公告)日: 2018-08-28
- 发明人: Toshihiro Kariya , Kensuke Masui , Takafumi Nakayama , Shuji Kanayama , Hiroyuki Takahashi
- 申请人: FUJIFILM CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: FUJIFILM CORPORATION
- 当前专利权人: FUJIFILM CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: SOLARIS Intellectual Property Group, PLLC
- 优先权: JP2014-147505 20140718; JP2015-132597 20150701
- 主分类号: H01L51/00
- IPC分类号: H01L51/00 ; H01L51/05
摘要:
An object of the present invention is to provide a composition for forming an organic semiconductor film that makes it possible to obtain an organic semiconductor film having excellent mobility and heat stability, an organic semiconductor element including an organic semiconductor film having excellent mobility and heat stability, and a method for manufacturing the organic semiconductor element.The composition for forming an organic semiconductor film of the present invention contains an organic semiconductor having a condensed polycyclic aromatic group and a polymer, in which the number of rings in the condensed polycyclic aromatic group is equal to or greater than 4, at least two rings in the condensed polycyclic aromatic group contain at least one atom selected from the group consisting of a sulfur atom, a nitrogen atom, a selenium atom, and an oxygen atom, the condensed polycyclic aromatic group contains, as a partial structure, at least any one structure selected from the group consisting of a benzene ring, a naphthalene ring, and a phenanthrene ring, and the polymer has a glass transition temperature of equal to or higher than −100° C. and equal to or less than −30° C. and an elastic recovery of equal to or less than 30%.
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