Invention Grant
- Patent Title: Extreme ultraviolet light source
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Application No.: US15790408Application Date: 2017-10-23
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Publication No.: US10064261B2Publication Date: 2018-08-28
- Inventor: Yezheng Tao , John Tom Stewart, IV , Jordan Jur , Daniel Brown , Alexander A. Schafgans , Jason M. Arcand , Andrew LaForge
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: DiBerardino McGovern IP Group LLC
- Main IPC: H05G2/00
- IPC: H05G2/00

Abstract:
An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.
Public/Granted literature
- US20180124906A1 EXTREME ULTRAVIOLET LIGHT SOURCE Public/Granted day:2018-05-03
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