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公开(公告)号：US20160255708A1
公开(公告)日：2016-09-01
申请号：US15148255
申请日：2016-05-06
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , John Tom Stewart, IV , Jordan Jur , Daniel Brown
IPC: H05G2/00
Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.
Abstract translation: 产生辐射的初始脉冲; 提取辐射的初始脉冲的一部分以形成修改的辐射脉冲，所述修改的辐射脉冲包括第一部分和第二部分，所述第一部分在时间上连接到所述第二部分，并且所述第一部分具有最大值 能量小于第二部分的最大能量; 修改的辐射脉冲的第一部分与靶材料相互作用以形成修饰的靶; 并且修改的辐射脉冲的第二部分与修饰的靶相互作用以产生发射极紫外（EUV）光的等离子体。
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Patent Agency Ranking
公开(公告)号：US09826616B2
公开(公告)日：2017-11-21
申请号：US15148255
申请日：2016-05-06
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , John Tom Stewart, IV , Jordan Jur , Daniel Brown
IPC: H05G2/00
Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.
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公开(公告)号：US09357625B2
公开(公告)日：2016-05-31
申请号：US14325153
申请日：2014-07-07
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , John Tom Stewart, IV , Jordan Jur , Andrew LaForge , Daniel Brown , Jason M. Arcand , Alexander A. Schafgans , Michael A. Purvis
IPC: H05G2/00
Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.
Abstract translation: 产生辐射的初始脉冲; 提取辐射的初始脉冲的一部分以形成修改的辐射脉冲，所述修改的辐射脉冲包括第一部分和第二部分，所述第一部分在时间上连接到所述第二部分，并且所述第一部分具有最大值 能量小于第二部分的最大能量; 修改的辐射脉冲的第一部分与靶材料相互作用以形成修饰的靶; 并且修改的辐射脉冲的第二部分与修饰的靶相互作用以产生发射极紫外（EUV）光的等离子体。
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公开(公告)号：US10064261B2
公开(公告)日：2018-08-28
申请号：US15790408
申请日：2017-10-23
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , John Tom Stewart, IV , Jordan Jur , Daniel Brown , Alexander A. Schafgans , Jason M. Arcand , Andrew LaForge
IPC: H05G2/00
Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.
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公开(公告)号：US20180124906A1
公开(公告)日：2018-05-03
申请号：US15790408
申请日：2017-10-23
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , John Tom Stewart, IV , Jordan Jur , Daniel Brown
IPC: H05G2/00
Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.
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公开(公告)号：US20160007434A1
公开(公告)日：2016-01-07
申请号：US14325153
申请日：2014-07-07
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , John Tom Stewart, IV , Jordan Jur , Andrew LaForge , Daniel Brown , Jason M. Arcand , Alexander A. Schafgans , Michael A. Purvis
IPC: H05G2/00
Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.
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