- 专利标题: Apparatuses including electrodes having a conductive barrier material and methods of forming same
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申请号: US15848477申请日: 2017-12-20
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公开(公告)号: US10069069B2公开(公告)日: 2018-09-04
- 发明人: Swapnil A. Lengade , John M. Meldrim , Andrea Gotti
- 申请人: MICRON TECHNOLOGY, INC.
- 申请人地址: US ID Boise
- 专利权人: Micron Technology, Inc.
- 当前专利权人: Micron Technology, Inc.
- 当前专利权人地址: US ID Boise
- 代理机构: Dorsey & Whitney LLP
- 主分类号: H01L45/00
- IPC分类号: H01L45/00 ; H01L27/24
摘要:
Apparatuses and methods of manufacture are disclosed for phase change memory cell electrodes having a conductive barrier material. In one example, an apparatus includes a first chalcogenide structure and a second chalcogenide structure stacked together with the first chalcogenide structure. A first electrode portion is coupled to the first chalcogenide structure, a second electrode portion is coupled to the second chalcogenide structure, and a third electrode portion is between the first and second electrode portions. A first portion of an electrically conductive barrier material is disposed between the first and third electrode portions. A second portion of the electrically conductive barrier material is disposed between the second and third electrode portions.
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