- Patent Title: Film forming apparatus, film forming method, and recording medium
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Application No.: US14926017Application Date: 2015-10-29
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Publication No.: US10072336B2Publication Date: 2018-09-11
- Inventor: Hitoshi Kato , Shigehiro Miura , Hiroyuki Kikuchi , Katsuyoshi Aikawa
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Nath, Goldberg & Meyer
- Agent Jerald L. Meyer
- Priority: JP2014-223701 20141031
- Main IPC: H01L21/67
- IPC: H01L21/67 ; C23C16/52 ; C23C16/458 ; C23C16/44 ; C23C16/455 ; H01L21/687 ; H01J37/32

Abstract:
A film forming apparatus includes a rotary table having a loading area at a first surface side thereof and revolving a substrate loaded on the loading area, a rotation mechanism rotating the loading area such that the substrate rotates around its axis, a processing gas supply mechanism supplying a processing gas to a processing gas supply area so that a thin film is formed on the substrate which repeatedly passes through the processing gas supply area the revolution of the substrate, and a control part configured to perform a calculation of a rotation speed of the substrate based on a parameter including a rotation speed of the rotary table to allow an orientation of the substrate to be changed whenever the substrate is positioned in the processing gas supply area, and to output a control signal for rotating the substrate at a calculated rotation speed.
Public/Granted literature
- US20160122872A1 FILM FORMING APPARATUS, FILM FORMING METHOD, AND RECORDING MEDIUM Public/Granted day:2016-05-05
Information query
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