Invention Grant
- Patent Title: Pellicle and photomask assembly including the same
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Application No.: US15155444Application Date: 2016-05-16
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Publication No.: US10073337B2Publication Date: 2018-09-11
- Inventor: Yong-seok Jung , Hwan-chul Jeon , Byung-gook Kim , Jae-hyuck Choi , Sung-won Kwon
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2015-0109574 20150803
- Main IPC: G03F1/64
- IPC: G03F1/64 ; G03F1/62
Abstract:
A pellicle includes a pellicle membrane, which includes a porous thin film. The porous thin film includes a plurality of nanowires, which are arranged across one another to form a net structure. A photomask assembly includes the pellicle and a photomask, wherein the pellicle is fixed to a surface of the photomask.
Public/Granted literature
- US20170038676A1 PELLICLE AND PHOTOMASK ASSEMBLY INCLUDING THE SAME Public/Granted day:2017-02-09
Information query
