公开(公告)号：US10437143B2

公开(公告)日：2019-10-08

申请号：US15627916

申请日：2017-06-20

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hwan-chul Jeon ,  Mun Ja Kim ,  Sung-won Kwon ,  Hee-bom Kim ,  Chang-young Jeong

IPC: G03F1/64 ,  G03F1/22 ,  G03F1/24 ,  G03F1/62 ,  G03F7/20

Abstract: Provided is a pellicle for exposure to extreme ultraviolet light (EUVL) according to an example embodiment, and the pellicle includes a pellicle membrane; and a frame attached to the pellicle membrane, wherein the pellicle membrane includes a carbon-based main layer that has a first surface and a second surface, which are two surfaces opposite to each other; and a boron-based enhancement layer covering at least one surface selected from the first surface and the second surface. The pellicle according to an example embodiment may be used for an extended period of time in an extreme ultraviolet light exposure environment.

公开(公告)号：US10073337B2

公开(公告)日：2018-09-11

申请号：US15155444

申请日：2016-05-16

Applicant: Samsung Electronics Co., Ltd.

Inventor： Yong-seok Jung ,  Hwan-chul Jeon ,  Byung-gook Kim ,  Jae-hyuck Choi ,  Sung-won Kwon

IPC: G03F1/64 ,  G03F1/62

CPC classification number: G03F1/64 ,  G03F1/62

Abstract: A pellicle includes a pellicle membrane, which includes a porous thin film. The porous thin film includes a plurality of nanowires, which are arranged across one another to form a net structure. A photomask assembly includes the pellicle and a photomask, wherein the pellicle is fixed to a surface of the photomask.