公开(公告)号：US20170102884A1

公开(公告)日：2017-04-13

申请号：US15222209

申请日：2016-07-28

Applicant: Samsung Electronics Co., Ltd.

Inventor： Byung-gook Kim ,  Young-bong Kim ,  Seung-hwan Ha ,  Sang-hoon Yoo

IPC: G06F3/06

CPC classification number: G06F3/0608 ,  G06F3/0613 ,  G06F3/0652 ,  G06F3/0659 ,  G06F3/0679 ,  G06F12/0246

Abstract: Disclosed is a method of operating a memory system which executes a plurality of commands including a write command and a trim command. The memory system includes a memory device, which includes a plurality of blocks. The method further includes performing garbage collection for generating a free block, calculating a workload level in performing the garbage collection, and changing a command schedule based on the workload level.

公开(公告)号：US10437145B2

公开(公告)日：2019-10-08

申请号：US15865717

申请日：2018-01-09

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jae-hyuck Choi ,  Jin-su Kim ,  Kyoung-mi Kim ,  Byung-gook Kim

IPC: G03F1/64

Abstract: A pellicle includes a pellicle frame, a pellicle membrane, and an attaching element, a first surface of the attaching element having exposed pores.

公开(公告)号：US10073337B2

公开(公告)日：2018-09-11

申请号：US15155444

申请日：2016-05-16

Applicant: Samsung Electronics Co., Ltd.

Inventor： Yong-seok Jung ,  Hwan-chul Jeon ,  Byung-gook Kim ,  Jae-hyuck Choi ,  Sung-won Kwon

IPC: G03F1/64 ,  G03F1/62

CPC classification number: G03F1/64 ,  G03F1/62

Abstract: A pellicle includes a pellicle membrane, which includes a porous thin film. The porous thin film includes a plurality of nanowires, which are arranged across one another to form a net structure. A photomask assembly includes the pellicle and a photomask, wherein the pellicle is fixed to a surface of the photomask.

公开(公告)号：US09880462B2

公开(公告)日：2018-01-30

申请号：US14849235

申请日：2015-09-09

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jae-hyuck Choi ,  Jin-su Kim ,  Kyoung-mi Kim ,  Byung-gook Kim

IPC: G03F1/62 ,  G03F1/64

CPC classification number: G03F1/64

Abstract: A pellicle includes a pellicle frame, a pellicle membrane, and an attaching element, a first surface of the attaching element having exposed pores.

公开(公告)号：US10114552B2

公开(公告)日：2018-10-30

申请号：US15222209

申请日：2016-07-28

Applicant: Samsung Electronics Co., Ltd.

Inventor： Byung-gook Kim ,  Young-bong Kim ,  Seung-hwan Ha ,  Sang-hoon Yoo

IPC: G06F12/00 ,  G06F13/00 ,  G06F3/06

Abstract: Disclosed is a method of operating a memory system which executes a plurality of commands including a write command and a trim command. The memory system includes a memory device, which includes a plurality of blocks. The method further includes performing garbage collection for generating a free block, calculating a workload level in performing the garbage collection, and changing a command schedule based on the workload level.

公开(公告)号：US09897554B2

公开(公告)日：2018-02-20

申请号：US15093770

申请日：2016-04-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ji-hoon Na ,  Dong-gun Lee ,  Byung-gook Kim ,  Rae-won Yi

IPC: G01B11/14 ,  G01N21/956 ,  G01B11/00 ,  G03F1/84

CPC classification number: G01N21/956 ,  G01B11/00 ,  G01N2021/95676 ,  G01N2201/103 ,  G03F1/84

Abstract: A method of inspecting a surface includes loading an inspection object on a stage of a multibeam inspection device configured to generate a beam array, and scanning a plurality of inspection areas of the inspection object at a same time with the beam array, wherein one of the first inspection areas is smaller than an area formed by a quadrangle connecting respective centers of corresponding four adjacent beams of the beam array, and an adjacent area of the one first inspection area is not scanned with the beam array.

公开(公告)号：US20160356727A1

公开(公告)日：2016-12-08

申请号：US15093770

申请日：2016-04-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ji-hoon Na ,  Dong-gun Lee ,  Byung-gook Kim ,  Rae-won Yi

IPC: G01N21/956 ,  G01B11/00

CPC classification number: G01N21/956 ,  G01B11/00 ,  G01N2021/95676 ,  G01N2201/103 ,  G03F1/84

Abstract: A method of inspecting a surface includes loading an inspection object on a stage of a multibeam inspection device configured to generate a beam array, and scanning a plurality of inspection areas of the inspection object at a same time with the beam array, wherein one of the first inspection areas is smaller than an area formed by a quadrangle connecting respective centers of corresponding four adjacent beams of the beam array, and an adjacent area of the one first inspection area is not scanned with the beam array.

Abstract translation: 检查表面的方法包括将检查对象加载在被配置为产生光束阵列的多光束检查装置的台上，并且与所述光束阵列同时扫描所述检查对象的多个检查区域，其中， 第一检查区域小于由连接梁阵列的对应的四个相邻梁的各个中心的四边形形成的区域，并且一个第一检查区域的相邻区域不被光束阵列扫描。

公开(公告)号：US10430083B2

公开(公告)日：2019-10-01

申请号：US16157300

申请日：2018-10-11

Applicant: Samsung Electronics Co., Ltd.

Inventor： Byung-gook Kim ,  Young-bong Kim ,  Seung-hwan Ha ,  Sang-hoon Yoo

IPC: G06F12/00 ,  G06F13/00 ,  G06F3/06 ,  G06F12/02

Abstract: Disclosed is a method of operating a memory system which executes a plurality of commands including a write command and a trim command. The memory system includes a memory device, which includes a plurality of blocks. The method further includes performing garbage collection for generating a free block, calculating a workload level in performing the garbage collection, and changing a command schedule based on the workload level.

公开(公告)号：US20170038676A1

公开(公告)日：2017-02-09

申请号：US15155444

申请日：2016-05-16

Applicant: Samsung Electronics Co., Ltd.

Inventor： Yong-seok JUNG ,  Hwan-Chul Jeon ,  Byung-gook Kim ,  Jae-hyuck Choi ,  Sung-won Kwon

IPC: G03F1/64

CPC classification number: G03F1/64 ,  G03F1/62

Abstract: A pellicle includes a pellicle membrane, which includes a porous thin film. The porous thin film includes a plurality of nanowires, which are arranged across one another to form a net structure. A photomask assembly includes the pellicle and a photomask, wherein the pellicle is fixed to a surface of the photomask.

Abstract translation: 防护薄膜组件包括防护薄膜，其包括多孔薄膜。 多孔薄膜包括多个纳米线，它们彼此排列以形成网状结构。 光掩模组件包括防护薄膜组件和光掩模，其中防护薄膜组件固定到光掩模的表面。