Invention Grant
- Patent Title: Photoresist nozzle device and photoresist supply system
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Application No.: US14135017Application Date: 2013-12-19
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Publication No.: US10074547B2Publication Date: 2018-09-11
- Inventor: Kuo-Shu Tseng , You-Feng Chen , Yen-Yu Chen
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: H01L21/67
- IPC: H01L21/67
Abstract:
Embodiments of a photoresist supply system including a photoresist nozzle device are provided. The photoresist nozzle device includes a tube including a first segment, a curved segment connected to the first segment, and a second segment connected to the curved segment. The photoresist nozzle device also includes a nozzle connected to the second segment.
Public/Granted literature
- US20150179483A1 PHOTORESIST NOZZLE DEVICE AND PHOTORESIST SUPPLY SYSTEM Public/Granted day:2015-06-25
Information query
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