- 专利标题： Lithographic apparatus and method
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申请号： US15321184申请日： 2015-06-04
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公开(公告)号： US10088756B2公开(公告)日： 2018-10-02
- 发明人: Sander Kerssemakers , Wilhelmus Petrus De Boeij , Gerben Frank De Lange , Christiaan Alexander Hoogendam , Petrus Franciscus Van Gils , Jelmer Mattheüs Kamminga , Jan Jaap Kuit , Carolus Johannes Catharina Schoormans
- 申请人： ASML Netherlands B.V.
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 优先权： EP14176184 20140708; EP14184775 20140915
- 国际申请： PCT/EP2015/062504 WO 20150604
- 国际公布： WO2016/005117 WO 20160114
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A lithographic apparatus comprising a support structure configured to be moved by a first scan distance during a single scanning operation when supporting a patterning device having a first extent in the scanning direction and to be moved by a second scan distance during a single scanning operation when supporting a patterning device having a second extent in the scanning N direction, and a substrate table configured to be moved by a third scan distance during a single scanning operation when the support structure supports a patterning device having the first extent in the scanning direction and to be moved by a fourth scan distance during a single scanning operation when the support structure supports a patterning device having the second extent in the scanning direction.
公开/授权文献
- US20170199467A1 LITHOGRAPHIC APPARATUS AND METHOD 公开/授权日：2017-07-13
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