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公开(公告)号：US11307507B2
公开(公告)日：2022-04-19
申请号：US16630668
申请日：2018-06-05
摘要： The present invention provides a method to obtain a height map of a substrate having alignment marks, the method comprising the steps: determining a height of one or more locations or areas of the substrate, and determining the height map of the substrate on the basis of the determined height of the one or more locations or areas of the substrate and a shape model of the substrate.
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公开(公告)号：US11874103B2
公开(公告)日：2024-01-16
申请号：US17412525
申请日：2021-08-26
发明人： Franciscus Godefridus Casper Bijnen , Junichi Kanehara , Stefan Carolus Jacobus Antonius Keij , Thomas Augustus Mattaar , Petrus Franciscus Van Gils
IPC分类号： G01B11/27
CPC分类号： G01B11/272
摘要： In order to improve the throughput performance and/or economy of a measurement apparatus, the present disclosure provides a metrology apparatus including: a first measuring apparatus; a second measuring apparatus; a first substrate stage configured to hold a first substrate and/or a second substrate; a second substrate stage configured to hold the first substrate and/or the second substrate; a first substrate handler configured to handle the first substrate and/or the second substrate; and a second substrate handler configured to handle the first substrate and/or the second substrate, wherein the first substrate is loaded from a first, second or third FOUP, wherein the second substrate is loaded from the first, second or third FOUP, wherein the first measuring apparatus is an alignment measuring apparatus, and wherein the second measuring apparatus is a level sensor, a film thickness measuring apparatus or a spectral reflectance measuring apparatus.
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公开(公告)号：US10908517B2
公开(公告)日：2021-02-02
申请号：US16615810
申请日：2018-04-18
发明人： Jean-Philippe Xavier Van Damme , Laurentius Johannes Adrianus Van Bokhoven , Petrus Franciscus Van Gils , Gerben Pieterse
摘要： The invention relates to a setpoint generator for moving a patterning device of a lithographic apparatus, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the setpoint generator comprises a finite number of movement profiles for the patterning device, and wherein the setpoint generator is configured to select one of the finite number of movement profiles based on a desired movement profile and to output the selected movement profile as a setpoint for the patterning device.
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公开(公告)号：US11105619B2
公开(公告)日：2021-08-31
申请号：US16629990
申请日：2018-07-13
发明人： Franciscus Godefridus Casper Bijnen , Junichi Kanehara , Stefan Carolus Jacobus Antonius Keij , Thomas Augustus Mattaar , Petrus Franciscus Van Gils
IPC分类号： G01B11/27
摘要： In order to improve the throughput performance and/or economy of a measurement apparatus, the present disclosure provides a metrology apparatus including: a first measuring apparatus; a second measuring apparatus; a first substrate stage configured to hold a first substrate and/or a second substrate; a second substrate stage configured to hold the first substrate and/or the second substrate; a first substrate handler configured to handle the first substrate and/or the second substrate; and a second substrate handler configured to handle the first substrate and/or the second substrate, wherein the first substrate is loaded from a first, second or third FOUP, wherein the second substrate is loaded from the first, second or third FOUP, wherein the first measuring apparatus is an alignment measuring apparatus, and wherein the second measuring apparatus is a level sensor, a film thickness measuring apparatus or a spectral reflectance measuring apparatus.
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公开(公告)号：US09606457B2
公开(公告)日：2017-03-28
申请号：US13748889
申请日：2013-01-24
发明人： Norbertus Josephus Martinus Van Den Nieuwelaar , Petrus Franciscus Van Gils , Arthur Erland Swaving
CPC分类号： G03F7/7075 , G03F7/00 , G03F7/70533 , G03F7/70725 , G03F7/70733 , G03F7/70991
摘要： A substrate handler for transferring substrates to be exposed from a track to a lithographic apparatus. The substrate handler comprises a controller. The controller is configured to determine an instance for starting a transfer process of a first one of the substrates. The instance is based on a predetermined processing characteristic of the lithographic apparatus, in order to maintain a transfer period of the substrate in the substrate handler substantially constant.
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公开(公告)号：US10401735B2
公开(公告)日：2019-09-03
申请号：US15778093
申请日：2016-11-03
发明人： Carolus Johannes Catharina Schoormans , Petrus Franciscus Van Gils , Johannes Jacobus Matheus Baselmans
摘要： A measurement method comprising using multiple radiation poles to illuminate a diffraction grating on a mask at a mask side of a projection system of a lithographic apparatus, coupling at least two different resulting diffraction orders per illumination pole through the projection system, using the projection system to project the diffraction orders onto a grating on a wafer such that a pair of combination diffraction orders is formed by diffraction of the diffraction orders, coupling the combination diffraction orders back through the projection system to detectors configured to measure the intensity of the combination diffraction orders, and using the measured intensity of the combination diffraction orders to measure the position of the wafer grating.
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公开(公告)号：US10088756B2
公开(公告)日：2018-10-02
申请号：US15321184
申请日：2015-06-04
发明人： Sander Kerssemakers , Wilhelmus Petrus De Boeij , Gerben Frank De Lange , Christiaan Alexander Hoogendam , Petrus Franciscus Van Gils , Jelmer Mattheüs Kamminga , Jan Jaap Kuit , Carolus Johannes Catharina Schoormans
IPC分类号： G03F7/20
摘要： A lithographic apparatus comprising a support structure configured to be moved by a first scan distance during a single scanning operation when supporting a patterning device having a first extent in the scanning direction and to be moved by a second scan distance during a single scanning operation when supporting a patterning device having a second extent in the scanning N direction, and a substrate table configured to be moved by a third scan distance during a single scanning operation when the support structure supports a patterning device having the first extent in the scanning direction and to be moved by a fourth scan distance during a single scanning operation when the support structure supports a patterning device having the second extent in the scanning direction.
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公开(公告)号：US10747120B2
公开(公告)日：2020-08-18
申请号：US16558265
申请日：2019-09-02
发明人： Carolus Johannes Catharina Schoormans , Petrus Franciscus Van Gils , Johannes Jacobus Matheus Baselmans
摘要： A measurement method comprising using multiple radiation poles to illuminate a diffraction grating on a mask at a mask side of a projection system of a lithographic apparatus, coupling at least two different resulting diffraction orders per illumination pole through the projection system, using the projection system to project the diffraction orders onto a grating on a wafer such that a pair of combination diffraction orders is formed by diffraction of the diffraction orders, coupling the combination diffraction orders back through the projection system to detectors configured to measure the intensity of the combination diffraction orders, and using the measured intensity of the combination diffraction orders to measure the position of the wafer grating.
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公开(公告)号：US20130215408A1
公开(公告)日：2013-08-22
申请号：US13748889
申请日：2013-01-24
发明人： Norbertus Josephus Martinus VAN DEN NIEUWELAAR , Petrus Franciscus Van Gils , Arthur Erland Swaving
IPC分类号： G03F7/00
CPC分类号： G03F7/7075 , G03F7/00 , G03F7/70533 , G03F7/70725 , G03F7/70733 , G03F7/70991
摘要： A substrate handler for transferring substrates to be exposed from a track to a lithographic apparatus. The substrate handler comprises a controller. The controller is configured to determine an instance for starting a transfer process of a first one of the substrates. The instance is based on a predetermined processing characteristic of the lithographic apparatus, in order to maintain a transfer period of the substrate in the substrate handler substantially constant.
摘要翻译： 用于将要从轨道暴露的衬底转移到光刻设备的衬底处理器。 基板处理器包括控制器。 控制器被配置为确定用于开始第一个基板的传送处理的实例。 该实例基于光刻设备的预定处理特性，以便保持基板处理器中的基板的转印周期基本恒定。
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