Invention Grant
- Patent Title: Method of manufacturing magnetoresistive random access memory device
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Application No.: US15824366Application Date: 2017-11-28
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Publication No.: US10096650B2Publication Date: 2018-10-09
- Inventor: Kwang-Seok Kim , Kee-Won Kim , Whan-Kyun Kim , Sang-Hwan Park , Young-Man Jang
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2015-0143897 20151015
- Main IPC: H01L27/22
- IPC: H01L27/22 ; H01L43/08 ; H01L43/02 ; H01L43/10

Abstract:
A magnetoresistive random access memory device includes a free layer, a tunnel barrier layer, an insulation barrier layer, a pinned layer, and a vertical polarizer structure. The tunnel barrier layer and the insulation barrier layer directly contacts different surfaces of the free layer. The pinned layer structure contacts the tunnel barrier layer and includes at least one pinned layer. The vertical polarizer structure contacts the insulation barrier layer and includes a plurality of magnetization multi-layered structures sequentially stacked. Each magnetization multi-layered structure includes a non-magnetic layer and a magnetic layer sequentially stacked. The pinned layer and the magnetic layer have magnetization directions anti-parallel to each other.
Public/Granted literature
- US20180083067A1 METHOD OF MANUFACTURING MAGNETORESISTIVE RANDOM ACCESS MEMORY DEVICE Public/Granted day:2018-03-22
Information query
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