Invention Grant
- Patent Title: Optical film stack with retardance layer having in-plane retardance of greater than 2.0 microns
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Application No.: US13977954Application Date: 2012-01-13
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Publication No.: US10114162B2Publication Date: 2018-10-30
- Inventor: Kenneth A. Epstein , Adam D. Haag , Seo-Hern Lee , Youn Sihn Kim , Myeong-Kyun Kang
- Applicant: Kenneth A. Epstein , Adam D. Haag , Seo-Hern Lee , Youn Sihn Kim , Myeong-Kyun Kang
- Applicant Address: US MN Saint Paul
- Assignee: 3M INNOVATIVE PROPERTIES COMPANY
- Current Assignee: 3M INNOVATIVE PROPERTIES COMPANY
- Current Assignee Address: US MN Saint Paul
- Agent Daniel J. Iden
- International Application: PCT/US2012/021291 WO 20120113
- International Announcement: WO2012/099794 WO 20120726
- Main IPC: G02B5/30
- IPC: G02B5/30 ; G02F1/1335 ; G02B5/02 ; G02F1/13363
Abstract:
Optical film stacks are disclosed. The optical film stacks can include a first reflective polarizer, a second reflective polarizer, and a retardance layer disposed between the first reflective polarizer and the second reflective polarizer.
Public/Granted literature
- US20130335823A1 Optical Film Stack Public/Granted day:2013-12-19
Information query
