专利检索 ap:("Kenneth A. Epstein" OR "Adam D. Haag" OR "Seo-Hern Lee" OR "Youn Sihn Kim" OR "Myeong-Kyun Kang") AND inv:"Youn Sihn Kim" 第 1 页

1.

发明授权
Optical film stack with retardance layer having in-plane retardance of greater than 2.0 microns 有权

公开(公告)号：US10114162B2

公开(公告)日：2018-10-30

申请号：US13977954

申请日：2012-01-13

申请人： Kenneth A. Epstein , Adam D. Haag , Seo-Hern Lee , Youn Sihn Kim , Myeong-Kyun Kang

发明人： Kenneth A. Epstein , Adam D. Haag , Seo-Hern Lee , Youn Sihn Kim , Myeong-Kyun Kang

IPC分类号： G02B5/30 , G02F1/1335 , G02B5/02 , G02F1/13363

摘要： Optical film stacks are disclosed. The optical film stacks can include a first reflective polarizer, a second reflective polarizer, and a retardance layer disposed between the first reflective polarizer and the second reflective polarizer.

2.

发明申请
Optical Film Stack 审中-公开
标题翻译：光学薄膜堆叠

公开(公告)号：US20130335823A1

公开(公告)日：2013-12-19

申请号：US13977954

申请日：2012-01-13

申请人： Kenneth A. Epstein , Adam D. Haag , Seo-Hern Lee , Youn Sihn Kim , Myeong-Kyun Kang

发明人： Kenneth A. Epstein , Adam D. Haag , Seo-Hern Lee , Youn Sihn Kim , Myeong-Kyun Kang

IPC分类号： G02B5/30

CPC分类号： G02B5/3083 , G02B5/0215 , G02B5/3041 , G02F1/133536 , G02F1/133634

摘要： Optical film stacks are disclosed. The optical film stacks can include a first reflective polarizer, a second reflective polarizer, and a retardance layer disposed between the first reflective polarizer and the second reflective polarizer.

摘要翻译： 公开了光学薄膜叠层。光学膜堆可以包括第一反射偏振器，第二反射偏振器和设置在第一反射偏振器和第二反射偏振器之间的延迟层。