Invention Grant
- Patent Title: Illumination system and projection objective of a mask inspection apparatus
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Application No.: US13587077Application Date: 2012-08-16
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Publication No.: US10114293B2Publication Date: 2018-10-30
- Inventor: Heiko Feldmann , Erik Matthias Sohmen , Joachim Stuehler , Oswald Gromer , Ulrich Mueller , Michael Layh , Markus Schwab
- Applicant: Heiko Feldmann , Erik Matthias Sohmen , Joachim Stuehler , Oswald Gromer , Ulrich Mueller , Michael Layh , Markus Schwab
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102010009022 20100222
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G01N21/956 ; G03F1/84
Abstract:
An illumination system and a projection objective of a mask inspection apparatus are provided. During operation of the mask inspection apparatus, the illumination system illuminates a mask with an illumination bundle of rays having a centroid ray that has a direction dependent on the location of the incidence of the illumination bundle of rays on the mask.
Public/Granted literature
- US20130038850A1 ILLUMINATION SYSTEM AND PROJECTION OBJECTIVE OF A MASK INSPECTION APPARATUS Public/Granted day:2013-02-14
Information query
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