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1.发明申请公开(公告)号：US20130038850A1
公开(公告)日：2013-02-14
申请号：US13587077
申请日：2012-08-16
申请人： Heiko Feldmann , Erik Matthias Sohmen , Joachim Stuehler , Oswald Gromer , Ulrich Mueller , Michael Layh , Markus Schwab
发明人： Heiko Feldmann , Erik Matthias Sohmen , Joachim Stuehler , Oswald Gromer , Ulrich Mueller , Michael Layh , Markus Schwab
IPC分类号： G03B27/54
CPC分类号： G03F7/70091 , G01N21/956 , G01N2021/95676 , G03F1/84
摘要： An illumination system and a projection objective of a mask inspection apparatus are provided. During operation of the mask inspection apparatus, the illumination system illuminates a mask with an illumination bundle of rays having a centroid ray that has a direction dependent on the location of the incidence of the illumination bundle of rays on the mask.
摘要翻译： 提供了一种面罩检查装置的照明系统和投影物镜。 在掩模检查装置的操作期间，照明系统用具有取决于掩模上的照射光束的入射位置的方向的质心射线的照射束照射掩模。
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公开(公告)号：US08264668B2
公开(公告)日：2012-09-11
申请号：US12496762
申请日：2009-07-02
申请人： Damian Fiolka , Manfred Maul , Markus Schwab , Wolfgang Seitz , Olaf Dittmann
发明人： Damian Fiolka , Manfred Maul , Markus Schwab , Wolfgang Seitz , Olaf Dittmann
IPC分类号： G03B27/72
CPC分类号： G03F7/70191 , G02B3/0056 , G02B5/1876 , G02B27/283 , G02B27/285 , G02B27/286 , G03F7/70566
摘要： The disclosure relates to an illumination system of a microlithographic projection exposure apparatus. The illumination system can include a depolariser which in conjunction with a light mixing system disposed downstream in the light propagation direction at least partially causes effective depolarisation of polarised light impinging on the depolariser. The illumination system can also include a microlens array which is arranged upstream of the light mixing system in the light propagation direction. The microlens array can include a plurality of microlenses arranged with a periodicity. The depolariser can be configured so that a contribution afforded by interaction of the depolariser with the periodicity of the microlens array to a residual polarisation distribution occurring in a pupil plane arranged downstream of the microlens array in the light propagation direction has a maximum degree of polarisation of not more than 5%.
摘要翻译： 本公开涉及一种微光刻投影曝光装置的照明系统。 照明系统可以包括去极化器，其与在光传播方向上设置的下游的光混合系统相结合，至少部分地导致撞击在去极化器上的偏振光的有效去极化。 照明系统还可以包括在光传播方向上布置在光混合系统的上游的微透镜阵列。 微透镜阵列可以包括以周期布置的多个微透镜。 去极化器可以被配置为使得通过去极化器的相互作用提供的贡献与微透镜阵列的周期性对在光传播方向上布置在微透镜阵列的下游的光瞳面中发生的残留极化分布产生的贡献具有最大的偏振度 不超过5％。
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公开(公告)号：US20090190116A1
公开(公告)日：2009-07-30
申请号：US12408577
申请日：2009-03-20
CPC分类号： G03B27/42 , G03F7/70258
摘要： A lithographic method of manufacturing a miniaturized device using a projection exposure system involves illuminating the object plane of an imaging optics of the projection exposure system with measuring light; detecting, for each of a plurality of locations on an image plane of the imaging optics, an angular distribution of an intensity of the measuring light traversing the image plane at the respective location; adjusting a telecentricity of the projection exposure system based on a selected patterning structure to be imaged and on the plurality of the detected angular distributions; disposing the selected pattern structure to be imaged in a region of the object plane of the imaging optics; disposing a substrate carrying a resist in a region of the image plane of the imaging optics and exposing the resist with imaging light using the projection exposure system with the adjusted telecentricity; and developing the exposed resist and processing the substrate with the developed resist.
摘要翻译： 使用投影曝光系统制造小型化装置的光刻方法包括用测量光照射投影曝光系统的成像光学元件的物平面; 针对所述摄像光学元件的像平面上的多个位置中的每一个检测在相应位置处穿过所述图像平面的测量光的角度分布; 基于要成像的所选择的图案化结构和所述多个所检测的角度分布来调整所述投影曝光系统的远心度; 将要成像的所选择的图案结构设置在成像光学器件的物平面的区域中; 在所述成像光学元件的像面的区域中设置携带抗蚀剂的基板，并且利用所述投影曝光系统以调节的远心度将成像光曝光; 并显影出曝光的抗蚀剂并用显影的抗蚀剂处理衬底。
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公开(公告)号：US10114293B2
公开(公告)日：2018-10-30
申请号：US13587077
申请日：2012-08-16
申请人： Heiko Feldmann , Erik Matthias Sohmen , Joachim Stuehler , Oswald Gromer , Ulrich Mueller , Michael Layh , Markus Schwab
发明人： Heiko Feldmann , Erik Matthias Sohmen , Joachim Stuehler , Oswald Gromer , Ulrich Mueller , Michael Layh , Markus Schwab
IPC分类号： G03F7/20 , G01N21/956 , G03F1/84
摘要： An illumination system and a projection objective of a mask inspection apparatus are provided. During operation of the mask inspection apparatus, the illumination system illuminates a mask with an illumination bundle of rays having a centroid ray that has a direction dependent on the location of the incidence of the illumination bundle of rays on the mask.
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5.发明授权Microlithographic exposure method as well as a projection exposure system for carrying out the method 有权微光刻曝光方法以及用于实施该方法的投影曝光系统公开(公告)号：US07847921B2
公开(公告)日：2010-12-07
申请号：US12177715
申请日：2008-07-22
申请人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
发明人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译： 在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。 通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。 可以在基于偏振光学测量数据的控制回路中进行极化处理。
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公开(公告)号：US20090040495A1
公开(公告)日：2009-02-12
申请号：US12058173
申请日：2008-03-28
申请人： Markus Schwab
发明人： Markus Schwab
IPC分类号： G03B27/72
CPC分类号： G03F7/70075 , G03F7/70191
摘要： An illumination system including an optical element, such as an optical filter, which can influence the optical properties of radiation impinging thereon is disclosed. Such a filter can have a variably adjustable absorption. The illumination system is employed for instance within a lithography apparatus. A method for the production of microelectronic components and an optical element influencing the optical properties of radiation impinging thereon are also disclosed.
摘要翻译： 公开了一种照明系统，其包括可以影响照射在其上的辐射的光学性质的诸如滤光器的光学元件。 这样的过滤器可以具有可变地调节的吸收。 照明系统例如在光刻设备中使用。 还公开了一种用于制造微电子部件的方法和影响其上照射的辐射的光学性质的光学元件。
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公开(公告)号：US20060146304A1
公开(公告)日：2006-07-06
申请号：US11294860
申请日：2005-12-05
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G03F7/70258
摘要： A lithographic method of manufacturing a miniaturized device using a projection exposure system comprises illuminating the object plane of an imaging optics of the projection exposure system with measuring light; detecting, for each of a plurality of locations on an image plane of the imaging optics, an angular distribution of an intensity of the measuring light traversing the image plane at the respective location; adjusting a telecentricity of the projection exposure system based on a selected patterning structure to be imaged and on the plurality of the detected angular distributions; disposing the selected pattern structure to be imaged in a region of the object plane of the imaging optics; disposing a substrate carrying a resist in a region of the image plane of the imaging optics and exposing the resist with imaging light using the projection exposure system with the adjusted telecentricity; and developing the exposed resist and processing the substrate with the developed resist.
摘要翻译： 使用投影曝光系统制造小型化装置的光刻方法包括用测量光照射投影曝光系统的成像光学元件的物平面; 针对所述摄像光学元件的像平面上的多个位置中的每一个检测在相应位置处穿过所述图像平面的测量光的角度分布; 基于要成像的所选择的图案化结构和所述多个所检测的角度分布来调整所述投影曝光系统的远心度; 将要成像的所选择的图案结构设置在成像光学器件的物平面的区域中; 在所述成像光学元件的像面的区域中设置携带抗蚀剂的基板，并且利用所述投影曝光系统以调节的远心度将成像光曝光; 并显影出曝光的抗蚀剂并用显影的抗蚀剂处理衬底。
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公开(公告)号：US09046786B2
公开(公告)日：2015-06-02
申请号：US13604296
申请日：2012-09-05
CPC分类号： G03F7/70158 , G03F7/70058
摘要： An illumination system of a microlithographic projection exposure apparatus includes a light source to produce projection light beam, and a first and a second diffractive optical element between the light source and a pupil plane of the illumination system. The diffractive effect produced by each diffractive optical element depends on the position of a light field that is irradiated by the projection light on the diffractive optical elements. A displacement mechanism changes the mutual spatial arrangement of the diffractive optical elements. In at least one of the mutual spatial arrangements, which can be obtained with the help of the displacement mechanism, the light field extends both over the first and the second diffractive optical element. This makes it possible to produce in a simple manner continuously variable illumination settings.
摘要翻译： 微光刻投影曝光装置的照明系统包括产生投射光束的光源和在光源和照明系统的光瞳面之间的第一和第二衍射光学元件。 由每个衍射光学元件产生的衍射效应取决于由投射光照射的衍射光学元件的光场的位置。 位移机构改变衍射光学元件的相互空间排列。 在借助位移机构可以获得的相互空间布置中的至少一个中，光场在第一和第二衍射光学元件的两端延伸。 这使得可以以简单的方式生产连续可变的照明设置。
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公开(公告)号：US08928859B2
公开(公告)日：2015-01-06
申请号：US13564419
申请日：2012-08-01
申请人： Damian Fiolka , Manfred Maul , Markus Schwab , Wolfgang Seitz , Olaf Dittmann
发明人： Damian Fiolka , Manfred Maul , Markus Schwab , Wolfgang Seitz , Olaf Dittmann
CPC分类号： G03F7/70191 , G02B3/0056 , G02B5/1876 , G02B27/283 , G02B27/285 , G02B27/286 , G03F7/70566
摘要： The disclosure relates to an illumination system of a microlithographic projection exposure apparatus. The illumination system can include a depolarizer which in conjunction with a light mixing system disposed downstream in the light propagation direction at least partially causes effective depolarization of polarized light impinging on the depolarizer. The illumination system can also include a microlens array which is arranged upstream of the light mixing system in the light propagation direction. The microlens array can include a plurality of microlenses arranged with a periodicity. The depolarizer can be configured so that a contribution afforded by interaction of the depolarizer with the periodicity of the microlens array to a residual polarization distribution occurring in a pupil plane arranged downstream of the microlens array in the light propagation direction has a maximum degree of polarization of not more than 5%.
摘要翻译： 本公开涉及一种微光刻投影曝光装置的照明系统。 照明系统可以包括消偏振器，其与在光传播方向上设置的下游的光混合系统相结合，至少部分地引起偏振光对去偏振器的有效去极化。 照明系统还可以包括在光传播方向上布置在光混合系统的上游的微透镜阵列。 微透镜阵列可以包括以周期布置的多个微透镜。 去极化器可以被配置为使得通过去偏振器的相互作用提供的贡献与微透镜阵列的周期性对在光传播方向上布置在微透镜阵列下游的光瞳面中发生的残留极化分布产生的贡献具有最大极化度 不超过5％。
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公开(公告)号：US08542342B2
公开(公告)日：2013-09-24
申请号：US12408577
申请日：2009-03-20
CPC分类号： G03B27/42 , G03F7/70258
摘要： A lithographic method of manufacturing a miniaturized device using a projection exposure system involves illuminating the object plane of an imaging optics of the projection exposure system with measuring light; detecting, for each of a plurality of locations on an image plane of the imaging optics, an angular distribution of an intensity of the measuring light traversing the image plane at the respective location; adjusting a telecentricity of the projection exposure system based on a selected patterning structure to be imaged and on the plurality of the detected angular distributions; disposing the selected pattern structure to be imaged in a region of the object plane of the imaging optics; disposing a substrate carrying a resist in a region of the image plane of the imaging optics and exposing the resist with imaging light using the projection exposure system with the adjusted telecentricity; and developing the exposed resist and processing the substrate with the developed resist.
摘要翻译： 使用投影曝光系统制造小型化装置的光刻方法包括用测量光照射投影曝光系统的成像光学元件的物平面; 针对所述摄像光学元件的像平面上的多个位置中的每一个检测在相应位置处穿过所述图像平面的测量光的角度分布; 基于要成像的所选择的图案化结构和所述多个所检测的角度分布来调整所述投影曝光系统的远心度; 将要成像的所选择的图案结构设置在成像光学器件的物平面的区域中; 在所述成像光学元件的像面的区域中设置携带抗蚀剂的基板，并且利用所述投影曝光系统以调节的远心度将成像光曝光; 并显影出曝光的抗蚀剂并用显影的抗蚀剂处理衬底。
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