- Patent Title: Cutting method of a multilayer structure containing a brittle layer
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Application No.: US15086062Application Date: 2016-03-31
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Publication No.: US10118255B2Publication Date: 2018-11-06
- Inventor: Jyun-Kai Ciou , Yung-Min Hsieh , Kuo-Hsin Huang , Naotoshi Inayama , Takehiko Isomoto , Takahide Fujii , Chang-Ying Chen
- Applicant: Industrial Technology Research Institute , Nippon Electric Glass Co., Ltd.
- Applicant Address: TW Hsinchu JP Shiga
- Assignee: Industrial Technology Research Institute,Nippon Electric Glass Co., Ltd.
- Current Assignee: Industrial Technology Research Institute,Nippon Electric Glass Co., Ltd.
- Current Assignee Address: TW Hsinchu JP Shiga
- Agency: JCIPRNET
- Main IPC: B23K26/00
- IPC: B23K26/00 ; B23K26/38 ; C03B33/02 ; C03B33/07 ; C03B33/04 ; B23K103/00

Abstract:
A cutting method of a multilayer structure containing a brittle layer is provided. The cutting method includes: cutting the multilayer structure to form a cut edge; removing a material of the multilayer structure other than the brittle layer along the cut edge, wherein the material of the multilayer structure other than the brittle layer has a width ranging from 1 micron to 2 millimeter; and modifying an edge of the brittle layer remaining after removing the material of the multilayer structure other than the brittle layer by a laser beam.
Public/Granted literature
- US20160288249A1 CUTTING METHOD OF A MULTILAYER STRUCTURE CONTAINING A BRITTLE LAYER Public/Granted day:2016-10-06
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