Invention Grant
- Patent Title: Object positioning in lithography
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Application No.: US15028676Application Date: 2014-09-25
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Publication No.: US10120293B2Publication Date: 2018-11-06
- Inventor: Hans Butler , Ramidin Izair Kamidi , Yanin Kasemsinsup
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2014/070472 WO 20140925
- International Announcement: WO2015/062791 WO 20150507
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03F7/20 ; G01B9/02 ; G01B11/00

Abstract:
An object positioning system includes an object; a measurement system to measure the position of the object, wherein each sensor of the measurement system has an associated measurement area on the object and wherein a location of at least one measurement area on the object is dependent on the position of the object; an actuator system to position the object; a control system configured to drive the actuator system, wherein the control system includes an observer with a dynamic model of the object to estimate an internal dynamic behavior of the object, wherein the dynamic model includes the dependency of the location of at least one measurement area on the position of the object, and wherein the control system is configured to drive the actuator system in dependency of an output of the observer.
Public/Granted literature
- US20160252827A1 OBJECT POSITIONING IN LITHOGRAPHY Public/Granted day:2016-09-01
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