- 专利标题: Plasma CVD apparatus, plasma CVD method, and agitating device
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申请号: US12865788申请日: 2008-02-06
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公开(公告)号: US10125421B2公开(公告)日: 2018-11-13
- 发明人: Yuuji Honda , Takayuki Abe
- 申请人: Yuuji Honda , Takayuki Abe
- 申请人地址: JP Chiba
- 专利权人: ADVANCED MATERIAL TECHNOLOGIES, INC.
- 当前专利权人: ADVANCED MATERIAL TECHNOLOGIES, INC.
- 当前专利权人地址: JP Chiba
- 代理机构: Wenderoth, Lind & Ponack, L.L.P.
- 国际申请: PCT/JP2008/052380 WO 20080206
- 国际公布: WO2009/098784 WO 20090813
- 主分类号: C23C16/50
- IPC分类号: C23C16/50 ; C23C16/44 ; B01J2/00 ; B01J2/12 ; C23C16/26 ; C23C16/442 ; H01J37/32
摘要:
A plasma CVD apparatus efficiently coats the surfaces of fine particles with a thin film or super-fine particles by concentrating a plasma near the fine particles. The plasma CVD apparatus includes a chamber, a container disposed in the chamber for housing the fine particles, the container having a polygonal inner shape in a cross section substantially perpendicular to a longitudinal axis of the container, a ground shielding member for shielding a surface of the container other than a housing face, a rotation mechanism for causing the container to rotate or act as a pendulum on an axis of rotation substantially perpendicular to the cross section, an opposed electrode disposed in the container so as to face the housing face, a plasma power source electrically connected to the container, a gas introducing mechanism for introducing a raw gas into the container, and an evacuation mechanism for evacuating the chamber.
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