- 专利标题: Memory circuit having shared word line
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申请号: US15251260申请日: 2016-08-30
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公开(公告)号: US10163491B2公开(公告)日: 2018-12-25
- 发明人: Hidehiro Fujiwara , Li-Wen Wang , Yen-Huei Chen , Hung-Jen Liao
- 申请人: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- 申请人地址: TW Hsinchu
- 专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- 当前专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Hauptman Ham, LLP
- 主分类号: G11C8/14
- IPC分类号: G11C8/14 ; G11C11/419 ; G11C11/418 ; H01L27/02 ; H01L27/11
摘要:
A memory circuit includes first and second memory cells. The first memory cell has an access port having a pass gate. The second memory cell also has an access port having a pass gate. The first and second memory cells abut one another along a column direction. The circuit includes at least one conductive structure over the first and second memory cells. The conductive structure may be two interconnected conductive lines. The conductive structure extends along a row direction in a conductive layer and is electrically coupled to the gate terminals of the pass gates.
公开/授权文献
- US20160372181A1 MEMORY CIRCUIT HAVING SHARED WORD LINE 公开/授权日:2016-12-22
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