Invention Grant
- Patent Title: Semiconductor device having jumper pattern
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Application No.: US14874989Application Date: 2015-10-05
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Publication No.: US10163879B2Publication Date: 2018-12-25
- Inventor: Jong-Hoon Jung
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-Do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Main IPC: H01L23/535
- IPC: H01L23/535 ; H01L27/02 ; H01L23/522 ; H01L23/528 ; H01L27/088 ; H01L29/06 ; H01L29/78 ; H01L21/8234

Abstract:
According to an exemplary embodiment of the present inventive concept, a semiconductor device is provided as follows. An active region is disposed in one side of a gate line. A non-active region is disposed in the other side of the gate line. A jumper pattern crosses a top portion of the gate line, overlapping the active region and the non-active region. A boundary between the active region and the non-active region is underneath the gate line.
Public/Granted literature
- US20170098641A1 SEMICONDUCTOR DEVICE HAVING JUMPER PATTERN Public/Granted day:2017-04-06
Information query
IPC分类: