Invention Grant
- Patent Title: Self-assembled pattern process for fabricating magnetic junctions usable in spin transfer torque applications
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Application No.: US15659613Application Date: 2017-07-25
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Publication No.: US10170518B2Publication Date: 2019-01-01
- Inventor: Vladimir Nikitin , Dmytro Apalkov , Sebastian Schafer
- Applicant: Samsung Electronics Co., LTD.
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Van Pelt, Yi & James LLP
- Main IPC: H01L27/22
- IPC: H01L27/22 ; H01L43/08 ; H01L43/10 ; H01L43/12 ; G11C11/16

Abstract:
Magnetic junctions usable in a magnetic device and a method for providing the magnetic junctions are described. A patterned seed layer is provided. The patterned seed layer includes magnetic seed islands interspersed with an insulating matrix. At least a portion of the magnetoresistive stack is provided after the patterned seed layer. The magnetoresistive stack includes at least one magnetic segregating layer. The magnetic segregating layer(s) include at least one magnetic material and at least one insulator. The method anneals the at least the portion of the magnetoresistive stack such that the at least one magnetic segregating layer segregates. The constituents of the magnetic segregating layer segregate such that portions of magnetic material(s) align with the magnetic seed islands(s) and such that portions of the insulator(s) align with the insulating matrix.
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