Invention Grant
- Patent Title: Apparatus for high pressure reaction
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Application No.: US15474806Application Date: 2017-03-30
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Publication No.: US10174438B2Publication Date: 2019-01-08
- Inventor: Rajeev Tirumala Pakalapati , Mark P. D'Evelyn
- Applicant: SLT TECHNOLOGIES, INC.
- Applicant Address: US CA Los Angeles
- Assignee: SLT TECHNOLOGIES, INC.
- Current Assignee: SLT TECHNOLOGIES, INC.
- Current Assignee Address: US CA Los Angeles
- Agency: Patterson & Sheridan, LLP
- Main IPC: C30B7/14
- IPC: C30B7/14 ; C30B7/10 ; C30B29/40

Abstract:
An apparatus for processing material at elevated pressure, the apparatus comprising: (a) two or more radial restraint structures defining an interior region configured to receive a processing chamber, the radial restraint structures being configured to resist an outward radial force from the interior region; (b) upper and lower crown members being disposed axially on either end of the interior region and configured to resist an outward axial force from the interior region; (c) a first axial restraint structure coupling the upper crown member and the lower crown member to provide axial restraint of the upper crown member and the lower crown; and (d) a second axial restraint structure compressing the two or more radial restraint structures to provide an axial restraint of the two or more radial restraint structures.
Public/Granted literature
- US20180282897A1 APPARATUS FOR HIGH PRESSURE REACTION Public/Granted day:2018-10-04
Information query
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