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公开(公告)号:US10293318B2
公开(公告)日:2019-05-21
申请号:US15269538
申请日:2016-09-19
Applicant: SLT TECHNOLOGIES, INC.
Inventor: Mark Philip D'Evelyn , Rajeev Tirumala Pakalapati
Abstract: A pressure release mechanism for use with a capsule for processing materials or growing crystals in supercritical fluids is disclosed. The capsule with the pressure release mechanism is scalable up to very large volumes and is cost effective according to a preferred embodiment. In conjunction with suitable high pressure apparatus, the capsule with pressure release mechanism is capable of processing materials at pressures and temperatures of 20-2000 MPa and 25-1500° C., respectively. Of course, there can be other variations, modifications, and alternatives.
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公开(公告)号:US10174438B2
公开(公告)日:2019-01-08
申请号:US15474806
申请日:2017-03-30
Applicant: SLT TECHNOLOGIES, INC.
Inventor: Rajeev Tirumala Pakalapati , Mark P. D'Evelyn
Abstract: An apparatus for processing material at elevated pressure, the apparatus comprising: (a) two or more radial restraint structures defining an interior region configured to receive a processing chamber, the radial restraint structures being configured to resist an outward radial force from the interior region; (b) upper and lower crown members being disposed axially on either end of the interior region and configured to resist an outward axial force from the interior region; (c) a first axial restraint structure coupling the upper crown member and the lower crown member to provide axial restraint of the upper crown member and the lower crown; and (d) a second axial restraint structure compressing the two or more radial restraint structures to provide an axial restraint of the two or more radial restraint structures.
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公开(公告)号:US20180282897A1
公开(公告)日:2018-10-04
申请号:US15474806
申请日:2017-03-30
Applicant: SLT TECHNOLOGIES, INC.
Inventor: Rajeev Tirumala Pakalapati , Mark P. D'Evelyn
CPC classification number: C30B7/105 , C30B7/14 , C30B29/406
Abstract: An apparatus for processing material at elevated pressure, the apparatus comprising: (a) two or more radial restraint structures defining an interior region configured to receive a processing chamber, the radial restraint structures being configured to resist an outward radial force from the interior region; (b) upper and lower crown members being disposed axially on either end of the interior region and configured to resist an outward axial force from the interior region; (c) a first axial restraint structure coupling the upper crown member and the lower crown member to provide axial restraint of the upper crown member and the lower crown; and (d) a second axial restraint structure compressing the two or more radial restraint structures to provide an axial restraint of the two or more radial restraint structures.
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