Invention Grant
- Patent Title: Excimer laser apparatus and excimer laser system
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Application No.: US15792111Application Date: 2017-10-24
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Publication No.: US10177520B2Publication Date: 2019-01-08
- Inventor: Takeshi Asayama , Osamu Wakabayashi , Kouji Kakizaki
- Applicant: Gigaphoton Inc.
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Priority: WOPCT/JP2013/084703 20131225
- Main IPC: H01S3/036
- IPC: H01S3/036 ; H01S3/134 ; H01S3/225 ; H01S3/038

Abstract:
The excimer laser apparatus may include a laser chamber configured to contain gas, a pair of electrodes provided in the laser chamber, a power source unit configured to supply a pulse voltage between the pair of electrodes, a gas supply unit configured to supply gas into the laser chamber, a gas exhaust unit configured to partially exhaust gas from within the laser chamber, and a gas control unit configured to control the gas supply unit and the gas exhaust unit, where a replacement ratio of gas to be replaced from within the laser chamber increases as deterioration of the pair of electrodes progresses, the deterioration being represented by a deterioration parameter of the pair of electrodes.
Public/Granted literature
- US20180048109A1 EXCIMER LASER APPARATUS AND EXCIMER LASER SYSTEM Public/Granted day:2018-02-15
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