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公开(公告)号：US10177520B2
公开(公告)日：2019-01-08
申请号：US15792111
申请日：2017-10-24
Applicant: Gigaphoton Inc.
Inventor： Takeshi Asayama , Osamu Wakabayashi , Kouji Kakizaki
Abstract: The excimer laser apparatus may include a laser chamber configured to contain gas, a pair of electrodes provided in the laser chamber, a power source unit configured to supply a pulse voltage between the pair of electrodes, a gas supply unit configured to supply gas into the laser chamber, a gas exhaust unit configured to partially exhaust gas from within the laser chamber, and a gas control unit configured to control the gas supply unit and the gas exhaust unit, where a replacement ratio of gas to be replaced from within the laser chamber increases as deterioration of the pair of electrodes progresses, the deterioration being represented by a deterioration parameter of the pair of electrodes.
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公开(公告)号：US08901524B2
公开(公告)日：2014-12-02
申请号：US14024198
申请日：2013-09-11
Applicant: Gigaphoton Inc
Inventor： Takeshi Asayama , Kouji Kakizaki , Akira Endo , Shinji Nagai
Abstract: An extreme ultraviolet light source apparatus generating an extreme ultraviolet light from plasma generated by irradiating a target material with a laser light within a chamber, and controlling a flow of ions generated together with the extreme ultraviolet light using a magnetic field or an electric field, the extreme ultraviolet light source apparatus comprises an ion collector device collecting the ion via an aperture arranged at a side of the chamber, and an interrupting mechanism interrupting movement of a sputtered particle in a direction toward the aperture, the sputtered particle generated at an ion collision surface collided with the ion in the ion collector device.
Abstract translation: 一种极紫外光源装置，通过在室内产生通过用激光照射目标材料而产生的等离子体的极紫外光，并且利用磁场或电场来控制与极紫外光一起产生的离子的流动， 极紫外光源装置包括离子收集器装置，该离子收集器装置通过布置在腔室一侧的孔收集离子，以及中断机构阻止溅射颗粒朝向孔的方向移动，溅射粒子在离子碰撞面 与离子收集器装置中的离子相撞。
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公开(公告)号：US09991665B2
公开(公告)日：2018-06-05
申请号：US15713761
申请日：2017-09-25
Applicant: Gigaphoton Inc.
Inventor： Hiroshi Umeda , Takeshi Asayama , Osamu Wakabayashi
IPC: H01S3/097 , B23K26/00 , H01L21/67 , H01S3/139 , H01L21/02 , H01S3/23 , H01S3/225 , H01S3/104 , H01S3/00 , H01S3/13
CPC classification number: H01S3/09702 , B23K26/00 , B23K26/0608 , H01L21/02686 , H01L21/67115 , H01S3/0057 , H01S3/104 , H01S3/1305 , H01S3/1394 , H01S3/225 , H01S3/2308 , H01S3/2383
Abstract: The laser system may include a delay circuit unit, first and second trigger-correction units, and a clock generator. The delay circuit unit may receive a trigger signal, output a first delay signal obtained by delaying the trigger signal by a first delay time, and output a second delay signal obtained by delaying the trigger signal by a second delay time. The first trigger-correction unit may receive the first delay signal and output a first switch signal obtained by delaying the first delay signal by a first correction time. The second trigger-correction unit may receive the second delay signal and output a second switch signal obtained by delaying the second delay signal by a second correction time. The clock generator may generate a clock signal that is common to the delay circuit unit and the first and second trigger-correction units.
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公开(公告)号：US09853410B2
公开(公告)日：2017-12-26
申请号：US15240162
申请日：2016-08-18
Applicant: Gigaphoton Inc.
Inventor： Takeshi Asayama , Hiroaki Tsushima , Kouji Kakizaki , Osamu Wakabayashi
IPC: H01S3/038 , H01S3/036 , H01S3/225 , H01S3/00 , G03F7/20 , H01S3/08 , H01S3/097 , H01S3/0971 , H01S3/134 , H01S3/13
CPC classification number: H01S3/038 , G03F7/70025 , H01S3/0014 , H01S3/036 , H01S3/08009 , H01S3/09705 , H01S3/0971 , H01S3/1305 , H01S3/134 , H01S3/225
Abstract: A gas laser apparatus includes a chamber containing a laser gas, a pair of electrodes disposed within the chamber, a fan disposed within the chamber, a motor connected to a rotating shaft of the fan, and a rotating speed control unit configured to control a rotating speed of the fan based on a wear-out parameter of the pair of electrodes.
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公开(公告)号：US09837780B2
公开(公告)日：2017-12-05
申请号：US15150800
申请日：2016-05-10
Applicant: Gigaphoton Inc.
Inventor： Takeshi Asayama , Osamu Wakabayashi , Kouji Kakizaki
Abstract: The excimer laser apparatus may include a laser chamber configured to contain gas, a pair of electrodes provided in the laser chamber, a power source unit configured to supply a pulse voltage between the pair of electrodes, a gas supply unit configured to supply gas into the laser chamber, a gas exhaust unit configured to partially exhaust gas from within the laser chamber, and a gas control unit configured to control the gas supply unit and the gas exhaust unit, where a replacement ratio of gas to be replaced from within the laser chamber increases as deterioration of the pair of electrodes progresses, the deterioration being represented by a deterioration parameter of the pair of electrodes.
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Patent Agency Ranking
公开(公告)号：US11079686B2
公开(公告)日：2021-08-03
申请号：US16871758
申请日：2020-05-11
Applicant: Gigaphoton Inc.
Inventor： Keisuke Ishida , Masato Moriya , Natsuhiko Kouno , Takeshi Asayama , Takashi Kusama
Abstract: An excimer laser apparatus according to the present disclosure includes an etalon spectrometer configured to measure a fringe waveform of a laser beam; and a controller configured to obtain area of a first ratio in a spectral space obtained based on a result of the measurement by the etalon spectrometer, calculate a first spectral line width of the laser beam based on the obtained area of the first ratio, and calibrate a first spectral line width based on a correlation function representing correlation between the first spectral line width and a second spectral line width of the laser beam measured by a reference meter.
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公开(公告)号：US09601893B2
公开(公告)日：2017-03-21
申请号：US15060148
申请日：2016-03-03
Applicant: GIGAPHOTON INC.
Inventor： Kouji Kakizaki , Takeshi Asayama , Osamu Wakabayashi
CPC classification number: H01S3/038 , H01S3/08009 , H01S3/134 , H01S3/225
Abstract: There may be provided a laser apparatus including: an optical resonator including an output coupler; a laser chamber containing a laser medium and disposed in an optical path inside the optical resonator; a pair of discharge electrodes disposed inside the laser chamber; an electrode gap varying section configured to vary a gap between the discharge electrodes; a laser beam measurement section disposed in an optical path of a laser beam outputted from the output coupler, the laser beam resulting from electric discharge between the discharge electrodes; and a controller configured to control the gap between the discharge electrodes through activating the electrode gap varying section, based on a beam parameter of the laser beam measured by the laser beam measurement section.
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公开(公告)号：US09331450B2
公开(公告)日：2016-05-03
申请号：US14663086
申请日：2015-03-19
Applicant: Gigaphoton Inc.
Inventor： Takeshi Asayama , Hakaru Mizoguchi , Kouji Kakizaki , Hiroaki Tsushima , Osamu Wakabayashi , Kazuya Takezawa
CPC classification number: H01S3/038 , H01S3/03 , H01S3/034 , H01S3/036 , H01S3/0388 , H01S3/08009 , H01S3/09702 , H01S3/104 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2256
Abstract: A laser apparatus according to embodiments may include a laser chamber including a laser gain medium; a power source; a first electrode to which a voltage is applied from the power source and a second electrode that is grounded, the first and second electrodes being disposed in the laser chamber; and a connector connected to the power source, and supporting the first electrode in a way that allows the first electrode to move toward a side where the second electrode is disposed.
Abstract translation: 根据实施例的激光装置可以包括包括激光增益介质的激光室; 电源; 从电源施加电压的第一电极和接地的第二电极，第一和第二电极设置在激光室中; 以及连接到所述电源的连接器，并且以允许所述第一电极向所述第二电极设置的一侧移动的方式支撑所述第一电极。
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公开(公告)号：US11451003B2
公开(公告)日：2022-09-20
申请号：US17009160
申请日：2020-09-01
Applicant: Gigaphoton Inc.
Inventor： Hiroaki Tsushima , Satoshi Tanaka , Yousuke Fujimaki , Takeshi Asayama , Osamu Wakabayashi
Abstract: A laser gas regenerating apparatus regenerates a discharged gas discharged from at least one ArF excimer laser apparatus and supplies the regenerated gas to the at least one ArF excimer laser apparatus connected to a first laser gas supply source that supplies a first laser gas and to a second laser gas supply source that supplies a second laser gas. The laser gas regenerating apparatus includes a data obtaining unit that obtains data on a supply amount of the second laser gas supplied to the at least one ArF excimer laser apparatus; a xenon adding unit that adds, to the regenerated gas, a third laser gas; and a control unit that controls, based on the supply amount, an addition amount of the third laser gas by the xenon adding unit.
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公开(公告)号：US10971886B2
公开(公告)日：2021-04-06
申请号：US16266189
申请日：2019-02-04
Applicant: Gigaphoton Inc.
Inventor： Takeshi Asayama , Hiroyuki Masuda
IPC: H01S3/097 , H01S3/036 , H01S3/134 , H01S3/225 , H01S3/104 , H01S3/038 , H01S3/0971 , H01S3/10 , H01S3/08 , H01S3/23 , H01S3/00
Abstract: A laser apparatus includes a chamber accommodating a pair of discharge electrodes, a gas supply and exhaust device configured to supply laser gas to an interior of the chamber and exhaust laser gas from the interior of the chamber, and a controller. The controller performs first control to control the gas supply and exhaust device so as to suspend laser oscillation and replace laser gas in the chamber at every first number of pulses or first elapsed time, and second control to control the gas supply and exhaust device so as to suspend laser oscillation and replace laser gas in the chamber before the first control at every second number of pulses less than the first number of pulses or second elapsed time less than the first elapsed time.
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