Invention Grant
- Patent Title: Photosensitive compositions, quantum dot polymer composite pattern prepared therefrom, and electronic devices including the same
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Application No.: US15295373Application Date: 2016-10-17
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Publication No.: US10203599B2Publication Date: 2019-02-12
- Inventor: Jonggi Kim , Shang Hyeun Park , Shin Ae Jun , Hojeong Paek
- Applicant: SAMSUNG ELECTRONICS CO., LTD. , Samsung SDI Co., Ltd.
- Applicant Address: KR Gyeonggi-Do KR Gyeonggi-Do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.,SAMSUNG SDI CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.,SAMSUNG SDI CO., LTD.
- Current Assignee Address: KR Gyeonggi-Do KR Gyeonggi-Do
- Agency: Cantor Colburn LLP
- Priority: KR10-2015-0147611 20151022
- Main IPC: G03F7/028
- IPC: G03F7/028 ; G03F7/033 ; G03F7/20 ; G03F7/32 ; G03F7/00 ; G03F7/16 ; G03F7/004

Abstract:
A photosensitive composition includes a plurality of quantum dots including an organic ligand on the surface thereof; a binder; a photopolymerizable monomer composition; photoinitiator; and a solvent, wherein the photopolymerizable monomer includes a main monomer having 1 to 6 carbon-carbon double bonds, a first accessory monomer having 8 to 20 carbon-carbon double bonds, and a second accessory monomer represented by Chemical Formula A; and a method of preparing the photosensitive composition and a quantum dot-polymer composite pattern prepared therefrom are provided: R1O-(L1)m-L3-A-L4-(L2)n-OR2 Chemical Formula A wherein, A, L1, L2, L3, L4, R1, and R2 are the same as defined herein.
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