Invention Grant
- Patent Title: Dielectric treatments for carbon nanotube devices
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Application No.: US15855477Application Date: 2017-12-27
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Publication No.: US10205097B2Publication Date: 2019-02-12
- Inventor: Damon B. Farmer , Martin M. Frank , Shu-Jen Han
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Michael J. Chang, LLC
- Agent Vazken Alexanian
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L29/08 ; H01L51/00 ; H01L29/786 ; H01L51/05

Abstract:
Dielectric treatments for carbon nanotube devices are provided. In one aspect, a method for forming a carbon nanotube-based device is provided. The method includes: providing at least one carbon nanotube disposed on a first dielectric; removing contaminants from surfaces of the first dielectric; and depositing a second dielectric onto the first dielectric and at least partially surrounding the at least one carbon nanotube. A carbon nanotube-based device is also provided.
Public/Granted literature
- US20180138415A1 Dielectric Treatments for Carbon Nanotube Devices Public/Granted day:2018-05-17
Information query
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