Invention Grant
- Patent Title: Sensor arrangement for particle analysis and a method for particle analysis
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Application No.: US15043701Application Date: 2016-02-15
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Publication No.: US10209212B2Publication Date: 2019-02-19
- Inventor: Guenther Ruhl , Thomas Hirsch , Gerhard Poeppel , Herbert Roedig
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Viering, Jentschaura & Partner MBB
- Main IPC: G01R17/00
- IPC: G01R17/00 ; G01N27/22 ; G01N15/10

Abstract:
According to various embodiments, a sensor arrangement for particle analysis may include: a base electrode configured to generate an electrical field for particle attraction; a support layer disposed over the base electrode; a sensor array disposed over the support layer and including or formed from a plurality of sensor elements, wherein each sensor element of the plurality of sensor elements is configured to generate or modify an electrical signal in response to a particle at least one of adsorbed to and approaching the sensor element; and an electrical contact structure may include or be formed from a plurality of contact lines, wherein each contact line of the plurality of contact lines is electrically connected to a respective sensor element of the plurality of sensor elements, such that each sensor element of the plurality of sensor elements is addressable via the contact structure.
Public/Granted literature
- US20170234822A1 SENSOR ARRANGEMENT FOR PARTICLE ANALYSIS AND A METHOD FOR PARTICLE ANALYSIS Public/Granted day:2017-08-17
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