Invention Grant
- Patent Title: Electrostatic discharge protection
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Application No.: US15066086Application Date: 2016-03-10
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Publication No.: US10211290B2Publication Date: 2019-02-19
- Inventor: Da-Wei Lai
- Applicant: NXP B.V.
- Applicant Address: NL Eindhoven
- Assignee: NXP B.V.
- Current Assignee: NXP B.V.
- Current Assignee Address: NL Eindhoven
- Main IPC: H01L27/02
- IPC: H01L27/02 ; H01L27/10 ; H01L29/08 ; H01L29/10

Abstract:
A bipolar junction transistor is configured to provide electrostatic discharge (ESD) protection for an integrated circuit. The bipolar junction transistor includes a substrate configured to function as a gate for the bipolar junction transistor. At least one drain finger extends in a first direction on a first surface of the substrate and is configured to function as a collector for the bipolar junction transistor. At least one source finger extends in the first direction on the first surface of the substrate and is configured to function as an emitter for the bipolar junction transistor. The at least one source finger includes a pickup region that is configured to set a substrate potential.
Public/Granted literature
- US20170263599A1 ELECTROSTATIC DISCHARGE PROTECTION Public/Granted day:2017-09-14
Information query
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