Invention Grant
- Patent Title: Methods and apparatus for a substrate core layer
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Application No.: US16001416Application Date: 2018-06-06
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Publication No.: US10212818B2Publication Date: 2019-02-19
- Inventor: Fei Yu , Anwar A. Mohammed , Rui Niu
- Applicant: Futurewei Technologies, Inc.
- Applicant Address: US TX Plano
- Assignee: FUTUREWEI TECHNOLOGIES, INC.
- Current Assignee: FUTUREWEI TECHNOLOGIES, INC.
- Current Assignee Address: US TX Plano
- Agency: Slater Matsil, LLP
- Main IPC: H05K1/03
- IPC: H05K1/03 ; H05K1/18 ; H05K3/34 ; H05K3/40 ; H01L23/00 ; H01L23/498 ; H01L23/538 ; H01L21/56 ; H01L23/31

Abstract:
A structure for a core layer of a substrate and a method for fabricating a core layer of a substrate are disclosed. The core layer comprises a molding compound encapsulating a die or a plurality of dies, a dielectric layer on the surfaces of the molding compound, and a conductive layer on top of the dielectric layer. A through hole is formed through the dielectric layer and the molding compound, which may be filled with a metal plate. A laser via is formed similarly. Build-up layers may be assembled next to the core layer to form the substrate, which can be used to package dies.
Public/Granted literature
- US20180288880A1 Methods and Apparatus for a Substrate Core Layer Public/Granted day:2018-10-04
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